Passivity and its breakdown on sputter-deposited amorphous Mn-Zr alloys in neutral chloride solutions

A. A. El-Moneim; Eiji Akiyama; H. Habazaki; A. Kawashima; K. Asami; K. Hashimoto

doi:10.1016/S0010-938X(97)00123-6

Passivity and its breakdown on sputter-deposited amorphous Mn-Zr alloys in neutral chloride solutions

A. A. El-Moneim, Eiji Akiyama, H. Habazaki, A. Kawashima, K. Asami, K. Hashimoto

Materials Design Division

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

Amorphous Mn-Zr alloys were prepared by DC magnetron sputtering in a wide composition range. The electrochemical behavior in borate-boric acid solutions of pH 8.4 containing 0.01-1M NaCl was investigated in combination with XPS analysis. All alloys were spontaneously passive. Their pitting potential increased with increasing zirconium content, and the alloys with 75-87 at.% zirconium possess higher pitting resistance than zirconium. The high passivating ability was attributed to the formation of a homogeneous double oxyhydroxide film composed of major Zr⁴⁺ and minor Mn²⁺. The formation of zirconium-enriched passive film results from preferential oxidation of zirconium with a consequent enrichment of manganese in the exterior of the underlying alloy surface. The formation of a zirconium oxyhydroxide film containing a few percent of manganese cations on zirconium-rich alloys is responsible for a significantly thinner film thickness and higher pitting resistance in comparison with zirconium.

Original language	English
Pages (from-to)	235-250
Number of pages	16
Journal	Corrosion Science
Volume	40
Issue number	2-3
DOIs	https://doi.org/10.1016/S0010-938X(97)00123-6
Publication status	Published - 1998 Feb 1

ASJC Scopus subject areas

Chemistry(all)
Chemical Engineering(all)
Materials Science(all)

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10.1016/S0010-938X(97)00123-6

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title = "Passivity and its breakdown on sputter-deposited amorphous Mn-Zr alloys in neutral chloride solutions",

abstract = "Amorphous Mn-Zr alloys were prepared by DC magnetron sputtering in a wide composition range. The electrochemical behavior in borate-boric acid solutions of pH 8.4 containing 0.01-1M NaCl was investigated in combination with XPS analysis. All alloys were spontaneously passive. Their pitting potential increased with increasing zirconium content, and the alloys with 75-87 at.% zirconium possess higher pitting resistance than zirconium. The high passivating ability was attributed to the formation of a homogeneous double oxyhydroxide film composed of major Zr4+ and minor Mn2+. The formation of zirconium-enriched passive film results from preferential oxidation of zirconium with a consequent enrichment of manganese in the exterior of the underlying alloy surface. The formation of a zirconium oxyhydroxide film containing a few percent of manganese cations on zirconium-rich alloys is responsible for a significantly thinner film thickness and higher pitting resistance in comparison with zirconium.",

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T1 - Passivity and its breakdown on sputter-deposited amorphous Mn-Zr alloys in neutral chloride solutions

AU - El-Moneim, A. A.

AU - Akiyama, Eiji

AU - Habazaki, H.

AU - Kawashima, A.

AU - Asami, K.

AU - Hashimoto, K.

PY - 1998/2/1

Y1 - 1998/2/1

N2 - Amorphous Mn-Zr alloys were prepared by DC magnetron sputtering in a wide composition range. The electrochemical behavior in borate-boric acid solutions of pH 8.4 containing 0.01-1M NaCl was investigated in combination with XPS analysis. All alloys were spontaneously passive. Their pitting potential increased with increasing zirconium content, and the alloys with 75-87 at.% zirconium possess higher pitting resistance than zirconium. The high passivating ability was attributed to the formation of a homogeneous double oxyhydroxide film composed of major Zr4+ and minor Mn2+. The formation of zirconium-enriched passive film results from preferential oxidation of zirconium with a consequent enrichment of manganese in the exterior of the underlying alloy surface. The formation of a zirconium oxyhydroxide film containing a few percent of manganese cations on zirconium-rich alloys is responsible for a significantly thinner film thickness and higher pitting resistance in comparison with zirconium.

AB - Amorphous Mn-Zr alloys were prepared by DC magnetron sputtering in a wide composition range. The electrochemical behavior in borate-boric acid solutions of pH 8.4 containing 0.01-1M NaCl was investigated in combination with XPS analysis. All alloys were spontaneously passive. Their pitting potential increased with increasing zirconium content, and the alloys with 75-87 at.% zirconium possess higher pitting resistance than zirconium. The high passivating ability was attributed to the formation of a homogeneous double oxyhydroxide film composed of major Zr4+ and minor Mn2+. The formation of zirconium-enriched passive film results from preferential oxidation of zirconium with a consequent enrichment of manganese in the exterior of the underlying alloy surface. The formation of a zirconium oxyhydroxide film containing a few percent of manganese cations on zirconium-rich alloys is responsible for a significantly thinner film thickness and higher pitting resistance in comparison with zirconium.

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ER -

Passivity and its breakdown on sputter-deposited amorphous Mn-Zr alloys in neutral chloride solutions

Abstract

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