Abstract
A diamond, mold patterned into self-ordered honeycomb structures was fabricated and pattern transfer was demonstrated with this mold. A diamond film was deposited onto a silicon substrate by hot-filament chemical vapor deposition and bonded with Pyrex glass by an anodic bonding technique. By removing the silicon substrate, the diamond film with a flat surface was formed on the Pyrex glass. The high aspect ratio of the pattern with 100 nm-pitch honeycomb structures was formed on the diamond thin film by a fast-atom beam of oxygen using an ordered porous alumina film as a mask. A dot pattern was transferred onto a polymethylmethacrylate (PMMA) film by an imprinting technique.
| Original language | English |
|---|---|
| Pages (from-to) | 3867-3870 |
| Number of pages | 4 |
| Journal | Japanese Journal of Applied Physics |
| Volume | 42 |
| Issue number | 6 B |
| DOIs | |
| Publication status | Published - 2003 Jun |
Keywords
- Diamond mold
- Fast atom beam
- Nanoimprint lithography
- Pattern transfer
- Porous almina