Perpendicular magnetic anisotropy in epitaxially strained cobalt-ferrite (001) thin films

H. Yanagihara; Y. Utsumi; T. Niizeki; J. Inoue; Eiji Kita

doi:10.1063/1.4864048

Perpendicular magnetic anisotropy in epitaxially strained cobalt-ferrite (001) thin films

H. Yanagihara, Y. Utsumi, T. Niizeki, J. Inoue, Eiji Kita

Research output: Contribution to journal › Article › peer-review

33 Citations (Scopus)

Abstract

We investigated the dependencies of both the magnetization characteristics and the perpendicular magnetic anisotropy of Co_xFe_3- _xO₄(001) epitaxial films (x=0.5 and 0.75) on the growth conditions of the reactive magnetron sputtering process. Both saturation magnetization and the magnetic uniaxial anisotropy constant K_u are strongly dependent on the reactive gas (O₂) flow rate, although there is little difference in the surface structures for all samples observed by reflection high-energy electron diffraction. In addition, certain dead-layer-like regions were observed in the initial stage of the film growth for all films. Our results suggest that the magnetic properties of Co _xFe_3-xO₄ epitaxial films are governed by the oxidation state and the film structure at the vicinity of the interface.

Original language	English
Article number	17A719
Journal	Journal of Applied Physics
Volume	115
Issue number	17
DOIs	https://doi.org/10.1063/1.4864048
Publication status	Published - 2014 May 7

ASJC Scopus subject areas

Physics and Astronomy(all)

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abstract = "We investigated the dependencies of both the magnetization characteristics and the perpendicular magnetic anisotropy of CoxFe3- xO4(001) epitaxial films (x=0.5 and 0.75) on the growth conditions of the reactive magnetron sputtering process. Both saturation magnetization and the magnetic uniaxial anisotropy constant Ku are strongly dependent on the reactive gas (O2) flow rate, although there is little difference in the surface structures for all samples observed by reflection high-energy electron diffraction. In addition, certain dead-layer-like regions were observed in the initial stage of the film growth for all films. Our results suggest that the magnetic properties of Co xFe3-xO4 epitaxial films are governed by the oxidation state and the film structure at the vicinity of the interface.",

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AU - Utsumi, Y.

AU - Niizeki, T.

AU - Inoue, J.

AU - Kita, Eiji

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AB - We investigated the dependencies of both the magnetization characteristics and the perpendicular magnetic anisotropy of CoxFe3- xO4(001) epitaxial films (x=0.5 and 0.75) on the growth conditions of the reactive magnetron sputtering process. Both saturation magnetization and the magnetic uniaxial anisotropy constant Ku are strongly dependent on the reactive gas (O2) flow rate, although there is little difference in the surface structures for all samples observed by reflection high-energy electron diffraction. In addition, certain dead-layer-like regions were observed in the initial stage of the film growth for all films. Our results suggest that the magnetic properties of Co xFe3-xO4 epitaxial films are governed by the oxidation state and the film structure at the vicinity of the interface.

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Perpendicular magnetic anisotropy in epitaxially strained cobalt-ferrite (001) thin films

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