Perpendicular magnetic anisotropy of Fe-Cr-N films prepared by DC reactive sputtering

Dong Liang Peng, Kenji Sumiyama, Toyohiko J. Konno, Kenji Suzuki

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)


Fe-Cr-N ternary films prepared by DC magnetron facing-target sputtering show perpendicular magnetic anisotropy. Upon appropriate adjustment of the chemical composition and deposition parameters, saturation magnetization of 0.37 0.5 Wb/m2 (300-400 emu/cm3) and perpendicular coercivity of 6.4×104-8.8×104 A/m (800-1100 Oe) are detected in the Fe-Cr-N films. X-ray diffraction measurements reveal that the films with large perpendicular anisotropy generally consist of the fine-grain α-Fe(Cr) phase and the γ′-(Fe, Cr)4Nx (x<1) phase having a pronounced (200) texture. By TEM observation, we found that the nonmagnetic γ′-(Fe, Cr)4Nx phase displays columnar growth and that the small ferromagnetic α-Fe(Cr) grains of about 2-20 nm diameter are located at grain boundaries of γ′-(Fe, Cr)4Nx grains in the Fe71Cr20N9 film.

Original languageEnglish
Pages (from-to)L479-L481
JournalJapanese Journal of Applied Physics
Issue number4 B
Publication statusPublished - 1997


Dive into the research topics of 'Perpendicular magnetic anisotropy of Fe-Cr-N films prepared by DC reactive sputtering'. Together they form a unique fingerprint.

Cite this