Abstract
Integration of Si/Si1-xGex/Si and Si p-i-n diodes with Si nitride optical waveguide on silicon-on-insulator (SOI) substrates has been achieved. For light emission from Si p-i-n diode, photo current of Si/Si1-xGex/Si p-i-n diode is larger than that of Si p-i-n diode, and increases with increasing Si1-xGex layer thickness and Ge fraction. From the relationship between photo current and effective electroluminescence intensity, it is suggested that the enhancement of photo current due to the Si1-xGex layer is caused not only by the narrowing of bandgap but also by the increase of photoelectric conversion efficiency.
Original language | English |
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Pages (from-to) | 399-401 |
Number of pages | 3 |
Journal | Thin Solid Films |
Volume | 508 |
Issue number | 1-2 |
DOIs | |
Publication status | Published - 2006 Jun 5 |
Keywords
- Germanium
- Light-Emitting-Diode
- Optoelectronic devices
- Photo detector
- Silicon