Abstract
We previously developed a novel photosensitive monolayer bearing a 4-(benzylsulfonyl)phenyl moiety as a photoreactive unit leading to photopattern by photolithography. The photosensitive monolayer transforms a monolayer composed of benzenesulfinic acid moiety by ultraviolet light exposure. The transformation causes the monolayer surface to be hydrophilic. To use widely the photopatterned monolayer, the photosensitivity of the monolayer should be improved. In this study, we synthesized 13 types of arylmethylsulfonylbenzenes as model compounds and investigated their photochemical behaviors in 2-propanol by ultraviolet light exposure. The photogeneration of benzenesulfinic acid from the arylmethylsulfonylbenzenes was compared by UV-visible spectral measurement and titration.
| Original language | English |
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| Pages | 877 |
| Number of pages | 1 |
| Publication status | Published - 2005 |
| Event | 54th SPSJ Annual Meeting 2005 - Yokohama, Japan Duration: 2005 May 25 → 2005 May 27 |
Conference
| Conference | 54th SPSJ Annual Meeting 2005 |
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| Country/Territory | Japan |
| City | Yokohama |
| Period | 05/5/25 → 05/5/27 |
Keywords
- Photochemical acid generation
- Photosensitive self-assembled monolayer