@inproceedings{3d58b8cc5a4f44d58616cdae42961064,
title = "Photochemical reduction of graphene oxide (GO) by femtosecond laser irradiation",
abstract = "In this study, we demonstrated a facile method for the reduction of graphene oxide (GO) by applying femtosecond laser pulse irradiation in aqueous colloidal solution. Utilization of femtosecond (fs) laser pulse irradiation enabled us to control GO reduction by adjusting laser fluence and irradiation time. The formation of reduced graphene oxide (rGO) was induced by solvated electrons generated through laser irradiation of colloidal GO solution, which was confirmed by means of UV-visible and Raman spectroscopy, XPS and XRD. By applying an optimum femtosecond laser condition, the interplanar spacing between carbon layers decreased significantly from 9.81 {\AA} to 3.52{\AA} indicating the effective removal of oxygen-containing groups from the basal plane of GO. Furthermore, the sheet resistivity of the fabricated rGO in disk form was 1,200 times lower than GO.",
keywords = "Graphene oxide, aqueous solution, electrical resistivity., femtosecond laser",
author = "Muttaqin and Takahiro Nakamura and Shunichi Sato",
note = "Publisher Copyright: {\textcopyright} 2016 SPIE.; Laser-Based Micro-and Nanoprocessing X ; Conference date: 16-02-2016 Through 18-02-2016",
year = "2016",
doi = "10.1117/12.2211583",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Arnold, {Craig B.} and Kunihiko Washio and Udo Klotzbach",
booktitle = "Laser-Based Micro-and Nanoprocessing X",
address = "United States",
}