Photoemission study of the negative electron affinity surfaces of O/Cs/Si(001)2x 1 and O/K/Si(001)2x 1

T. Abukawa, Y. Enta, T. Kashiwakura, S. Suzuki, S. Kono

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28 Citations (Scopus)

Abstract

We have found that a negative electron affinity (NEA) surface can be formed by exposing a K saturated Si(001)2Xl surface to oxygen gas just as in the formation of a NEA surface of O/Cs/Si (001) 2 × 1. By x-ray photoelectron diffraction we have found that the arrangement of O and K atoms in the NEA O/K/Si(001)2 × 1 surface is essentially the same as that in the NEA O/Cs/Si (001)2X 1 surface in which a double layer of alkali metal is preserved. Angle resolved ultraviolet photoelectron spectroscopy (ARUPS) has been applied to the two NEA surfaces. The resulting ARUPS spectra can give useful information on bonding at the NEA surfaces if they are combined with theoretical calculations.

Original languageEnglish
Pages (from-to)3205-3209
Number of pages5
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume8
Issue number4
DOIs
Publication statusPublished - 1990 Jul

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