TY - JOUR
T1 - Photoresponsivity of ZnO Schottky barrier diodes
AU - Oh, D. C.
AU - Suzuki, T.
AU - Hanada, T.
AU - Yao, T.
AU - Makino, H.
AU - Ko, H. J.
PY - 2006/5
Y1 - 2006/5
N2 - We report on the photoresponsivity of ZnO Schottky barrier diodes grown on (0001) GaN Al2 O3 substrates by plasma-assisted molecular-beam epitaxy. First, ZnO Schottky barrier diodes show a reverse saturation current of ∼ 10-8 A in the dark, and they present a large current buildup of ∼ 103 A under ultraviolet light illumination, with maintaining stable diode characteristics. Second, ZnO Schottky barrier diodes have a large bandwidth of 195 nm, where the short-wavelength cutoff and the long-wavelength cutoff are 195 and 390 nm, respectively. Third, ZnO Schottky barrier diodes have a time constant of 0.36 ms. Consequently, it is suggested that the ZnO Schottky barrier diodes are very promising for ultraviolet photodetector applications.
AB - We report on the photoresponsivity of ZnO Schottky barrier diodes grown on (0001) GaN Al2 O3 substrates by plasma-assisted molecular-beam epitaxy. First, ZnO Schottky barrier diodes show a reverse saturation current of ∼ 10-8 A in the dark, and they present a large current buildup of ∼ 103 A under ultraviolet light illumination, with maintaining stable diode characteristics. Second, ZnO Schottky barrier diodes have a large bandwidth of 195 nm, where the short-wavelength cutoff and the long-wavelength cutoff are 195 and 390 nm, respectively. Third, ZnO Schottky barrier diodes have a time constant of 0.36 ms. Consequently, it is suggested that the ZnO Schottky barrier diodes are very promising for ultraviolet photodetector applications.
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U2 - 10.1116/1.2200378
DO - 10.1116/1.2200378
M3 - Article
AN - SCOPUS:33744795179
SN - 1071-1023
VL - 24
SP - 1595
EP - 1598
JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
IS - 3
ER -