Films of a commercially available polyarylate (U polymer®) containing a photosensitive agent were prepared by means of spin-coating onto copper foil, which showed positive-tone behavior after UV irradiation and development with an ethanolamine/N-methyl-pyrrolidone/H2O mixture. Scanning electron microscope photographs of the images exhibited fine patterns (≈10 μm line/space resolution) with 9-14 μm film thickness. The pattern-forming mechanism is based on the reaction development patterning (RDP) process, where the main pattern-forming reaction occurs during development.
|Number of pages||5|
|Journal||Macromolecular Rapid Communications|
|Publication status||Published - 2002 Jan 31|
- Reaction development patterning (RDP)