Photosensitive polyarylates based on reaction development patterning

Toshiyuki Oyama; Akira Kitamura; Takafumi Fukushima; Takao Iijima; Masao Tomoi

doi:10.1002/1521-3927(20020101)23:2<104::AID-MARC104>3.0.CO;2-8

Photosensitive polyarylates based on reaction development patterning

Toshiyuki Oyama, Akira Kitamura, Takafumi Fukushima, Takao Iijima, Masao Tomoi

ENG - Mechanical Systems Engineering

Yokohama National University

Research output: Contribution to journal › Article › peer-review

27 Citations (Scopus)

Abstract

Films of a commercially available polyarylate (U polymer®) containing a photosensitive agent were prepared by means of spin-coating onto copper foil, which showed positive-tone behavior after UV irradiation and development with an ethanolamine/N-methyl-pyrrolidone/H₂O mixture. Scanning electron microscope photographs of the images exhibited fine patterns (≈10 μm line/space resolution) with 9-14 μm film thickness. The pattern-forming mechanism is based on the reaction development patterning (RDP) process, where the main pattern-forming reaction occurs during development.

Original language	English
Pages (from-to)	104-108
Number of pages	5
Journal	Macromolecular Rapid Communications
Volume	23
Issue number	2
DOIs	https://doi.org/10.1002/1521-3927(20020101)23:2<104::AID-MARC104>3.0.CO;2-8
Publication status	Published - 2002 Jan 31

Keywords

Diazonaphthoquinone
Photoresists
Polyarylates
Polyesters
Reaction development patterning (RDP)

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10.1002/1521-3927(20020101)23:2<104::AID-MARC104>3.0.CO;2-8

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title = "Photosensitive polyarylates based on reaction development patterning",

abstract = "Films of a commercially available polyarylate (U polymer{\textregistered}) containing a photosensitive agent were prepared by means of spin-coating onto copper foil, which showed positive-tone behavior after UV irradiation and development with an ethanolamine/N-methyl-pyrrolidone/H2O mixture. Scanning electron microscope photographs of the images exhibited fine patterns (≈10 μm line/space resolution) with 9-14 μm film thickness. The pattern-forming mechanism is based on the reaction development patterning (RDP) process, where the main pattern-forming reaction occurs during development.",

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T1 - Photosensitive polyarylates based on reaction development patterning

AU - Oyama, Toshiyuki

AU - Kitamura, Akira

AU - Fukushima, Takafumi

AU - Iijima, Takao

AU - Tomoi, Masao

PY - 2002/1/31

Y1 - 2002/1/31

N2 - Films of a commercially available polyarylate (U polymer®) containing a photosensitive agent were prepared by means of spin-coating onto copper foil, which showed positive-tone behavior after UV irradiation and development with an ethanolamine/N-methyl-pyrrolidone/H2O mixture. Scanning electron microscope photographs of the images exhibited fine patterns (≈10 μm line/space resolution) with 9-14 μm film thickness. The pattern-forming mechanism is based on the reaction development patterning (RDP) process, where the main pattern-forming reaction occurs during development.

AB - Films of a commercially available polyarylate (U polymer®) containing a photosensitive agent were prepared by means of spin-coating onto copper foil, which showed positive-tone behavior after UV irradiation and development with an ethanolamine/N-methyl-pyrrolidone/H2O mixture. Scanning electron microscope photographs of the images exhibited fine patterns (≈10 μm line/space resolution) with 9-14 μm film thickness. The pattern-forming mechanism is based on the reaction development patterning (RDP) process, where the main pattern-forming reaction occurs during development.

KW - Diazonaphthoquinone

KW - Photoresists

KW - Polyarylates

KW - Polyesters

KW - Reaction development patterning (RDP)

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Photosensitive polyarylates based on reaction development patterning

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Keywords

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