Photosensitive polycarbonates based on reaction development patterning (RDP)

T. Oyama; Y. Kawakami; T. Fukushima; T. Iijima; M. Tomoi

doi:10.1007/s002890170009

Photosensitive polycarbonates based on reaction development patterning (RDP)

T. Oyama, Y. Kawakami, T. Fukushima, T. Iijima, M. Tomoi

Research output: Contribution to journal › Article › peer-review

34 Citations (Scopus)

Abstract

Films of commercially available poly(bisphenol A carbonate) (BPA-PC) and poly[bisphenol A carbonate-co-4,4′-(3,3,S-trimethylcyclohexylidene)diphenol carbonate] (BPA-TMC-PC) containing photosensitive agent (diazonaphthoquinone (DNQ) compound) were prepared by spin-coating onto copper foil. The obtained films showed positive-tone behavior by UV irradiation and following development with ethanolamine/N-methylpyrrolidone (NMP)/H₂O mixture (1/1/1 by weight). The scanning electron microscope (SEM) photographs of the resulting images exhibited fine patterns (∼ 10 μm line/space resolution) with 15-16 μm film thickness. The pattern forming mechanism is based on the Reaction Development Patterning (RDP), in which the carboxylic acid resulting from photo-rearrangement of DNQ in the film attracts ethanolamine in the developer and the amine reacts with carbonate in the main chain to induce degradation of the polymer. RDP, where the main pattern forming reaction occurs during the development, is proved to be efficient for polycarbonates as well as polyimide.

Original language	English
Pages (from-to)	175-181
Number of pages	7
Journal	Polymer Bulletin
Volume	47
Issue number	2
DOIs	https://doi.org/10.1007/s002890170009
Publication status	Published - 2001 Nov 15
Externally published	Yes

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Polymers and Plastics
Materials Chemistry

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title = "Photosensitive polycarbonates based on reaction development patterning (RDP)",

abstract = "Films of commercially available poly(bisphenol A carbonate) (BPA-PC) and poly[bisphenol A carbonate-co-4,4′-(3,3,S-trimethylcyclohexylidene)diphenol carbonate] (BPA-TMC-PC) containing photosensitive agent (diazonaphthoquinone (DNQ) compound) were prepared by spin-coating onto copper foil. The obtained films showed positive-tone behavior by UV irradiation and following development with ethanolamine/N-methylpyrrolidone (NMP)/H2O mixture (1/1/1 by weight). The scanning electron microscope (SEM) photographs of the resulting images exhibited fine patterns (∼ 10 μm line/space resolution) with 15-16 μm film thickness. The pattern forming mechanism is based on the Reaction Development Patterning (RDP), in which the carboxylic acid resulting from photo-rearrangement of DNQ in the film attracts ethanolamine in the developer and the amine reacts with carbonate in the main chain to induce degradation of the polymer. RDP, where the main pattern forming reaction occurs during the development, is proved to be efficient for polycarbonates as well as polyimide.",

author = "T. Oyama and Y. Kawakami and T. Fukushima and T. Iijima and M. Tomoi",

year = "2001",

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T1 - Photosensitive polycarbonates based on reaction development patterning (RDP)

AU - Oyama, T.

AU - Kawakami, Y.

AU - Fukushima, T.

AU - Iijima, T.

AU - Tomoi, M.

PY - 2001/11/15

Y1 - 2001/11/15

N2 - Films of commercially available poly(bisphenol A carbonate) (BPA-PC) and poly[bisphenol A carbonate-co-4,4′-(3,3,S-trimethylcyclohexylidene)diphenol carbonate] (BPA-TMC-PC) containing photosensitive agent (diazonaphthoquinone (DNQ) compound) were prepared by spin-coating onto copper foil. The obtained films showed positive-tone behavior by UV irradiation and following development with ethanolamine/N-methylpyrrolidone (NMP)/H2O mixture (1/1/1 by weight). The scanning electron microscope (SEM) photographs of the resulting images exhibited fine patterns (∼ 10 μm line/space resolution) with 15-16 μm film thickness. The pattern forming mechanism is based on the Reaction Development Patterning (RDP), in which the carboxylic acid resulting from photo-rearrangement of DNQ in the film attracts ethanolamine in the developer and the amine reacts with carbonate in the main chain to induce degradation of the polymer. RDP, where the main pattern forming reaction occurs during the development, is proved to be efficient for polycarbonates as well as polyimide.

AB - Films of commercially available poly(bisphenol A carbonate) (BPA-PC) and poly[bisphenol A carbonate-co-4,4′-(3,3,S-trimethylcyclohexylidene)diphenol carbonate] (BPA-TMC-PC) containing photosensitive agent (diazonaphthoquinone (DNQ) compound) were prepared by spin-coating onto copper foil. The obtained films showed positive-tone behavior by UV irradiation and following development with ethanolamine/N-methylpyrrolidone (NMP)/H2O mixture (1/1/1 by weight). The scanning electron microscope (SEM) photographs of the resulting images exhibited fine patterns (∼ 10 μm line/space resolution) with 15-16 μm film thickness. The pattern forming mechanism is based on the Reaction Development Patterning (RDP), in which the carboxylic acid resulting from photo-rearrangement of DNQ in the film attracts ethanolamine in the developer and the amine reacts with carbonate in the main chain to induce degradation of the polymer. RDP, where the main pattern forming reaction occurs during the development, is proved to be efficient for polycarbonates as well as polyimide.

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Photosensitive polycarbonates based on reaction development patterning (RDP)

Abstract

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