TY - JOUR
T1 - Photosensitive polyetherimide (Ultem) based on reaction development patterning (RDP)
AU - Fukushima, Takafumi
AU - Kawakami, Yukiko
AU - Oyama, Toshiyuki
AU - Tomoi, Masao
PY - 2002
Y1 - 2002
N2 - Photosensitive polyetherimide (PEI) consisting of non-photosensitive PEI (Ultem®) and photosensitive diazonaphthoquinone (DNQ) compounds gave positive-tone behavior by UV irradiation, followed by development in solution including ethanolamine. The SEM of the resultant images showed fine patterns with 10-15 μm film thickness. GPC and 1H-NMR measurements that can give information on the structure of dissolved components in the irradiated region were carried out in order to clarify the mechanism of pattern formation. The imaging of photosensitive PEI is based on reaction development patterning (RDP), where the amine causes main-chain scission directly related to the pattern formation in development step to form low molecular weight amidized products.
AB - Photosensitive polyetherimide (PEI) consisting of non-photosensitive PEI (Ultem®) and photosensitive diazonaphthoquinone (DNQ) compounds gave positive-tone behavior by UV irradiation, followed by development in solution including ethanolamine. The SEM of the resultant images showed fine patterns with 10-15 μm film thickness. GPC and 1H-NMR measurements that can give information on the structure of dissolved components in the irradiated region were carried out in order to clarify the mechanism of pattern formation. The imaging of photosensitive PEI is based on reaction development patterning (RDP), where the amine causes main-chain scission directly related to the pattern formation in development step to form low molecular weight amidized products.
KW - Diazonaphthoquinone
KW - Polyetherimide
KW - Positive photosensitive polymer
KW - Reaction development patterning (RDP)
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U2 - 10.2494/photopolymer.15.191
DO - 10.2494/photopolymer.15.191
M3 - Article
AN - SCOPUS:0036363153
SN - 0914-9244
VL - 15
SP - 191
EP - 196
JO - Journal of Photopolymer Science and Technology
JF - Journal of Photopolymer Science and Technology
IS - 2
ER -