Polarity control of ZnO films on (0001) Al2 O3 by Cr-compound intermediate layers

J. S. Park, S. K. Hong, T. Minegishi, S. H. Park, I. H. Im, T. Hanada, M. W. Cho, T. Yao, J. W. Lee, J. Y. Lee

Research output: Contribution to journalArticlepeer-review

47 Citations (Scopus)

Abstract

This letter presents a reliable and very easy method for selective growth of polarity controlled ZnO films on (0001) Al2 O3 substrates by plasma-assisted molecular-beam epitaxy. Cr-compound intermediate layers are used to control the crystal polarity of ZnO films on (0001) Al2 O3. ZnO films grown on rocksalt structure CrN/(0001) Al2 O3 shows Zn polarity, while those grown on rhombohedral Cr2 O3 (0001) Al2 O3 shows O polarity. Possible interface atomic arrangements for both heterostructures are proposed.

Original languageEnglish
Article number201907
JournalApplied Physics Letters
Volume90
Issue number20
DOIs
Publication statusPublished - 2007

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