Abstract
Sulfonated cyclodextrins (s-α-CyD and s-β-CyD) were employed for constructing photosensitive thin films containing azobenzene residues. Azobenzene-modified poly(allylamine hydrochloride) (Az-PAH) and s-α-CyD or s-β-CyD were deposited alternately on the surface of a quartz slide to prepare multilayer thin films. Az-PAH formed inclusion complex in the Az-PAH/s-α-CyD film but not in the Az-PAH/s-β-CyD film. The Az-PAH isomerized from E - to Z -isomer in the films under UV light irradiation, and the original E -form was recovered under visible light irradiation or thermally in dark. The thermal isomerization followed the first-order kinetics in the swelled films though the kinetics deviated from the first-order plot in the dry films. The host-guest complexation of Az-PAH and s-α-CyD in the film affected significantly on the photochemical and thermal isomerization.
Original language | English |
---|---|
Pages (from-to) | 579-583 |
Number of pages | 5 |
Journal | Materials Science and Engineering C |
Volume | 23 |
Issue number | 5 |
DOIs | |
Publication status | Published - 2003 Oct 15 |
Keywords
- Azobenzene
- Cyclodextrin
- Photoresponse
- Polyelectrolyte multilayer film
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering