TY - JOUR
T1 - Polytype control by activity ratio of silicon to carbon during SiC solution growth using multicomponent solvents
AU - Horio, Atsushi
AU - Harada, Shunta
AU - Koike, Daiki
AU - Murayama, Kenta
AU - Aoyagi, Kenta
AU - Sakai, Takenobu
AU - Tagawa, Miho
AU - Ujihara, Toru
N1 - Publisher Copyright:
© 2016 The Japan Society of Applied Physics.
PY - 2016/1
Y1 - 2016/1
N2 - We report on the relationship between grown polytypes and the activity ratio of silicon to carbon during SiC solution growth using multicomponent solvents. From the thermodynamic calculation as well as crystallization experiments, we revealed that a high activity ratio (aSi/aC) in the solution leads to the growth of low-hexagonality polytypes, and low aSi/aC results in the growth of high-hexagonality polytypes. 4H-SiC is stable when aSi/aC is relatively low (∼101 > aSi/aC), 3C-SiC is stable when aSi/aC is relatively high (∼104 < aSi/aC), and 6H-SiC is stable in the intermediate aSi/aC range (∼102 < aSi/aC < ∼103). From these results, the Cr-Si solvent at high temperatures is expected to be suitable for 4H-SiC growth, and Sc-Si and Fe-Si solvents at relatively low temperatures are expected to be suitable for 3C-SiC growth.
AB - We report on the relationship between grown polytypes and the activity ratio of silicon to carbon during SiC solution growth using multicomponent solvents. From the thermodynamic calculation as well as crystallization experiments, we revealed that a high activity ratio (aSi/aC) in the solution leads to the growth of low-hexagonality polytypes, and low aSi/aC results in the growth of high-hexagonality polytypes. 4H-SiC is stable when aSi/aC is relatively low (∼101 > aSi/aC), 3C-SiC is stable when aSi/aC is relatively high (∼104 < aSi/aC), and 6H-SiC is stable in the intermediate aSi/aC range (∼102 < aSi/aC < ∼103). From these results, the Cr-Si solvent at high temperatures is expected to be suitable for 4H-SiC growth, and Sc-Si and Fe-Si solvents at relatively low temperatures are expected to be suitable for 3C-SiC growth.
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U2 - 10.7567/JJAP.55.01AC01
DO - 10.7567/JJAP.55.01AC01
M3 - Article
AN - SCOPUS:84953323688
SN - 0021-4922
VL - 55
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 1
M1 - 01AC01
ER -