Recent dedicated electron microscopes have various imaging functions (diffraction contrast, phase contrast, scattering contrast), which can be combined with spectroscopy methods (EDS, EELS, CL, SXES). Depending on the purpose of an investigation, a combination of an imaging mode and a spectroscopy method can produce a functional image, which might be directly related to material’s physical properties. TEM have commercially realized atomic-column imaging performance using high-angle scattered electron intensity. It is achieved by a commercialization of Cs-corrector. Scanning-TEM method with sub-nm probe linked with high-throughput EDS and/or EELS can give us elemental or electronic information imaging with an atomic-column resolution. Furthermore, it has been trying a control of ambient conditions (temperature, pressure, electric and magnetic field) of specimens for in situ observations. Despite of those valuable improvements on TEM, high-energy electron beam irradiation cannot escape from making irradiation damages. One possible way is a fast data acquisition before happen a serial affection of irradiation damage on specimen.