Precise control of gas concentration ratio in process chamber

M. Nagase, M. Kitano, Y. Shirai, T. Ohmi

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)


A new system for controlling gas concentration in a process chamber was developed using a combination of a new flow controller and a gas pumping system. The new flow controller does not exhibit overshooting; thus, a stable gas flow rate can be realized in a process chamber after valve operation. Furthermore, very rapid gas displacement in the chamber can be realized by combined gas flow system and pumping system. As a result, it took only 2 s to stabilize chamber pressure and gas composition from purge gas to process gases using Fourier transform infrared spectroscopy (FT-IR) method. It is possible to control process parameters such as gas concentration and working pressure during the entire process using this system.

Original languageEnglish
Pages (from-to)5168-5172
Number of pages5
JournalJapanese Journal of Applied Physics
Issue number8
Publication statusPublished - 2001 Aug


  • Flow controller
  • Gas concentration
  • Working pressure


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