@inproceedings{818116ca0a2d46a38a882dcd52a712cf,
title = "Precise evaluation of Zero-CTE temperature of EUVL-grade TiO 2-SiO 2 ultra-low-expansion glass using the line-focus-beam ultrasonic material characterization system",
abstract = "This paper presents a calibration line between leaky surface acoustic wave (LSAW) velocities (V LSAW) and coefficientof-thermal-expansion (CTE) characteristics for TiO 2-doped SiO 2 (TiO 2-SiO 2) glass to evaluate the absolute CTE by the line-focus-beam ultrasonic material characterization (LFB-UMC) system. Commercial TiO 2-SiO 2 ultra-low-expansion glass and synthetic silica glass were selected as specimens. We measured V LSAW by the LFB-UMC system and CTE characteristics by dilatometers, and obtained relationships among V LSAW, CTE at 22°C {CTE(22°C)} and zero-CTE temperature {T(zero-CTE)}. Resolutions of CTE(22°C) and T(zero-CTE) determined by the LSAW velocity measurement were estimated as ±0.72 (ppb/K) and ±0.14°C (±2σ, σ standard deviation) at 225 MHz. Both manufacturers and users can precisely inspect T(zero-CTE) for all EUVL-grade ultra-low-expansion glass substrates by this indirect evaluation method using the calibration line.",
keywords = "Absolute CTE, Calibration line, CTE evaluation, EUVL system, Leaky surface acoustic waves, Line-focus-beam ultrasonic material characterization system, TiO -SiO ultra-low-expansion glass, Velocity measurement",
author = "Kushibiki, {Jun Ichi} and Mototaka Arakawa",
year = "2009",
doi = "10.1117/12.814179",
language = "English",
isbn = "9780819475244",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Alternative Lithographic Technologies",
note = "Alternative Lithographic Technologies ; Conference date: 24-02-2009 Through 26-02-2009",
}