Abstract
Precise wavelength control of a multiple-wavelength DFB laser-diode (LD) array was achieved using weighted-dose allocation variable-pitch EB-lithography (WAVE) and highly uniform MOVPE. Multiple-wavelength 1.3 μm λ/4-shifted DFB LD arrays with wavelength spacing of 2.0 nm were successfully demonstrated. The standard deviation of the wavelength was as low as 0.37 nm over 2-in wafers.
Original language | English |
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Pages (from-to) | 288-290 |
Number of pages | 3 |
Journal | IEEE Photonics Technology Letters |
Volume | 9 |
Issue number | 3 |
DOIs | |
Publication status | Published - 1997 Mar |
Externally published | Yes |
Keywords
- Distributed feedback lasers
- Electron beam lithography
- Gratings
- Semiconductor laser arrays
- Wavelength division multiplexing
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Electrical and Electronic Engineering