PREPARATION AND RESOLUTION CHARACTERISTICS OF A NOVEL SILICON BASED NEGATIVE RESIST.

Akinobu Tanaka, Masao Morita, Saburo Imamura, Toshiaki Tamamura, Osamu Kogure

Research output: Contribution to journal › Conference article › peer-review

Original language	English
Pages (from-to)	309-310
Number of pages	2
Journal	American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
Volume	25
Issue number	1
Publication status	Published - 1984 Apr 1
Externally published	Yes

ASJC Scopus subject areas

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title = "PREPARATION AND RESOLUTION CHARACTERISTICS OF A NOVEL SILICON BASED NEGATIVE RESIST.",

author = "Akinobu Tanaka and Masao Morita and Saburo Imamura and Toshiaki Tamamura and Osamu Kogure",

year = "1984",

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language = "English",

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journal = "American Chemical Society, Polymer Preprints, Division of Polymer Chemistry",

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T1 - PREPARATION AND RESOLUTION CHARACTERISTICS OF A NOVEL SILICON BASED NEGATIVE RESIST.

AU - Tanaka, Akinobu

AU - Morita, Masao

AU - Imamura, Saburo

AU - Tamamura, Toshiaki

AU - Kogure, Osamu

PY - 1984/4/1

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JO - American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

JF - American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

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