TY - JOUR
T1 - Preparation conditions of CaTiO3 film by metal-organic chemical vapor deposition
AU - Sato, Mitsutaka
AU - Tu, Rong
AU - Goto, Takashi
PY - 2006/5
Y1 - 2006/5
N2 - Calcium titanate (CaTiO3) films were prepared by metal-organic chemical vapor deposition (MOCVD) using Ca(dpm)2 and Ti(O-iPr) 2(dpm)2 precursors. The phases, composition and morphology of Ca-Ti-O system films changed depending on molar ratio of Ca to Ti (R Ca/Ti). total pressure (Ptot) and substrate temperature (Tsub). CaTiO3 films in a single phase were obtained at the condition of RCa/Ti = 0.95, Tsub = 1073 K and P tot =0.8 kPa, and ACa/Ti = 0.78, Tsub = 973 K and Ptot =0.8 kPa. The CaTiO3 films prepared at T sub = 1073 K had a welldeveloped columnar texture, and significant (010) orientation was observed at RCa/Ti from 0.59 to 0.72. The deposition rate showed the highest value of 1.25 × 10-8 ms -1 at Tsub = 1073 K, Ptot, = 0.4 kPa and R Ca/Ti = 0.95.
AB - Calcium titanate (CaTiO3) films were prepared by metal-organic chemical vapor deposition (MOCVD) using Ca(dpm)2 and Ti(O-iPr) 2(dpm)2 precursors. The phases, composition and morphology of Ca-Ti-O system films changed depending on molar ratio of Ca to Ti (R Ca/Ti). total pressure (Ptot) and substrate temperature (Tsub). CaTiO3 films in a single phase were obtained at the condition of RCa/Ti = 0.95, Tsub = 1073 K and P tot =0.8 kPa, and ACa/Ti = 0.78, Tsub = 973 K and Ptot =0.8 kPa. The CaTiO3 films prepared at T sub = 1073 K had a welldeveloped columnar texture, and significant (010) orientation was observed at RCa/Ti from 0.59 to 0.72. The deposition rate showed the highest value of 1.25 × 10-8 ms -1 at Tsub = 1073 K, Ptot, = 0.4 kPa and R Ca/Ti = 0.95.
KW - CaTiO. crystal structure
KW - Deposition rate
KW - Metal-organic chemical vapor deposition
KW - Microstructure
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U2 - 10.2320/matertrans.47.1386
DO - 10.2320/matertrans.47.1386
M3 - Article
AN - SCOPUS:33745779230
SN - 1345-9678
VL - 47
SP - 1386
EP - 1390
JO - Materials Transactions
JF - Materials Transactions
IS - 5
ER -