Preparation of a high-jc Y-Ba-Cu-O film at 700 °C by thermal chemical vapor deposition

Hisanori Yamane, Toshio Hirai, Kazuo Watanabe, Norio Kobayashi, Yoshio Muto, Masaharu Hasei, Hideyuki Kurosawa

Research output: Contribution to journalArticlepeer-review

24 Citations (Scopus)

Abstract

A high-Jc Y-Ba-Cu-O superconducting film was successfully prepared at 700 °C on a SrTiO3(100) single-crystal substrate without postannealing by thermal chemical vapor deposition under a low-oxygen partial pressure of 0.036 Torr in the total gas introduced into a hot-wall-type reactor (total gas pressure: 10 Torr), using 1% O2 balanced with Ar as a reactant gas. The sources for the elements of Ba, Y, and Cu were β-diketone metal chelates. The film mainly consisted of YBa 2Cu3Ox with c-axis orientation perpendicular to the substrate plane and included small amounts of a-axis oriented and randomly oriented grains. The film showed the superconducting transition temperature defined by zero resistivity at 89 K. The critical current density based on a 2 μV/cm criterion was 2.2 × 106 A/cm2 at 77.3 K and 0 T.

Original languageEnglish
Pages (from-to)7948-7950
Number of pages3
JournalJournal of Applied Physics
Volume69
Issue number11
DOIs
Publication statusPublished - 1991

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