Preparation of an epitaxy-ready surface of a ZnO(0001) substrate

Shunsuke Akasaka; Ken Nakahara; Hiroyuki Yuji; Atsushi Tsukazaki; Akira Ohtomo; Masashi Kawasaki

doi:10.1143/APEX.4.035701

Preparation of an epitaxy-ready surface of a ZnO(0001) substrate

Shunsuke Akasaka, Ken Nakahara, Hiroyuki Yuji, Atsushi Tsukazaki, Akira Ohtomo, Masashi Kawasaki

IMR - Materials Property Division

Research output: Contribution to journal › Article › peer-review

20 Citations (Scopus)

Abstract

We show that there can be a contamination of silica particles on the surface of chemo-mechanically polished ZnO substrates. Consideration of the base of electrochemistry led us to a hypothesis that the alkaline polishing solution produces a layer of Zn(OH)₂ capturing silica particles. In-situ observation of the etching process in an acidic solution by means of an atomic force microscope as well as zeta potential measurements supports this hypothesis and gives a clear guidance to solve the problem. We find that an epitaxy-ready surface can be reproducibly prepared by dipping ZnO substrates in an HCl solution (HCl : H₂O = 7 : 200) for 30 s.

Original language	English
Article number	035701
Journal	Applied Physics Express
Volume	4
Issue number	3
DOIs	https://doi.org/10.1143/APEX.4.035701
Publication status	Published - 2011 Mar

Access to Document

10.1143/APEX.4.035701

Cite this

@article{5a8f90293ebf45dc8a445764ec58edee,

title = "Preparation of an epitaxy-ready surface of a ZnO(0001) substrate",

abstract = "We show that there can be a contamination of silica particles on the surface of chemo-mechanically polished ZnO substrates. Consideration of the base of electrochemistry led us to a hypothesis that the alkaline polishing solution produces a layer of Zn(OH)2 capturing silica particles. In-situ observation of the etching process in an acidic solution by means of an atomic force microscope as well as zeta potential measurements supports this hypothesis and gives a clear guidance to solve the problem. We find that an epitaxy-ready surface can be reproducibly prepared by dipping ZnO substrates in an HCl solution (HCl : H2O = 7 : 200) for 30 s.",

author = "Shunsuke Akasaka and Ken Nakahara and Hiroyuki Yuji and Atsushi Tsukazaki and Akira Ohtomo and Masashi Kawasaki",

year = "2011",

month = mar,

doi = "10.1143/APEX.4.035701",

language = "English",

volume = "4",

journal = "Applied Physics Express",

issn = "1882-0778",

publisher = "Japan Society of Applied Physics",

number = "3",

}

TY - JOUR

T1 - Preparation of an epitaxy-ready surface of a ZnO(0001) substrate

AU - Akasaka, Shunsuke

AU - Nakahara, Ken

AU - Yuji, Hiroyuki

AU - Tsukazaki, Atsushi

AU - Ohtomo, Akira

AU - Kawasaki, Masashi

PY - 2011/3

Y1 - 2011/3

N2 - We show that there can be a contamination of silica particles on the surface of chemo-mechanically polished ZnO substrates. Consideration of the base of electrochemistry led us to a hypothesis that the alkaline polishing solution produces a layer of Zn(OH)2 capturing silica particles. In-situ observation of the etching process in an acidic solution by means of an atomic force microscope as well as zeta potential measurements supports this hypothesis and gives a clear guidance to solve the problem. We find that an epitaxy-ready surface can be reproducibly prepared by dipping ZnO substrates in an HCl solution (HCl : H2O = 7 : 200) for 30 s.

AB - We show that there can be a contamination of silica particles on the surface of chemo-mechanically polished ZnO substrates. Consideration of the base of electrochemistry led us to a hypothesis that the alkaline polishing solution produces a layer of Zn(OH)2 capturing silica particles. In-situ observation of the etching process in an acidic solution by means of an atomic force microscope as well as zeta potential measurements supports this hypothesis and gives a clear guidance to solve the problem. We find that an epitaxy-ready surface can be reproducibly prepared by dipping ZnO substrates in an HCl solution (HCl : H2O = 7 : 200) for 30 s.

UR - http://www.scopus.com/inward/record.url?scp=79952509660&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79952509660&partnerID=8YFLogxK

U2 - 10.1143/APEX.4.035701

DO - 10.1143/APEX.4.035701

M3 - Article

AN - SCOPUS:79952509660

SN - 1882-0778

VL - 4

JO - Applied Physics Express

JF - Applied Physics Express

IS - 3

M1 - 035701

ER -

Preparation of an epitaxy-ready surface of a ZnO(0001) substrate

Abstract

Access to Document

Other files and links

Fingerprint

Cite this