Preparation of barium titanate film by metal-organic chemical vapor deposition and its thermodynamic analysis

T. Tohma; H. Masumoto; T. Hirai; T. Goto

doi:10.2320/matertrans.42.702

Preparation of barium titanate film by metal-organic chemical vapor deposition and its thermodynamic analysis

T. Tohma, H. Masumoto, T. Hirai, T. Goto

FRIS - Advanced Interdisciplinary Research Division

Tohoku University

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

BaTiO₃ films were prepared on fused silica substrates by metal-organic chemical vapor deposition (MOCVD). Effect of deposition conditions on the composition, structure and morphology were studied. Thermodynamic calculations well predicted the relationship between deposition conditions and the phases of deposits. BaTiO₃ films in a single phase were obtained at 973 K and Ba/Ti ratio in the source gas of 0.25 to 0.35. The grain size of BaTiO₃ films increased with decreasing total pressure. BaTiO₃ film in thickness of about 1 μm had a relative dielectric constant of 480. The dielectric constant of the BaTiO₃ film showed the maximum value of 530 at 360 K.

Original language	English
Pages (from-to)	702-706
Number of pages	5
Journal	Materials Transactions
Volume	42
Issue number	4
DOIs	https://doi.org/10.2320/matertrans.42.702
Publication status	Published - 2001

Keywords

Barium titanate
Dielectric constant
Metal-organic chemical vapor deposition
Thermodynamic analysis
Thin film

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10.2320/matertrans.42.702

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title = "Preparation of barium titanate film by metal-organic chemical vapor deposition and its thermodynamic analysis",

abstract = "BaTiO3 films were prepared on fused silica substrates by metal-organic chemical vapor deposition (MOCVD). Effect of deposition conditions on the composition, structure and morphology were studied. Thermodynamic calculations well predicted the relationship between deposition conditions and the phases of deposits. BaTiO3 films in a single phase were obtained at 973 K and Ba/Ti ratio in the source gas of 0.25 to 0.35. The grain size of BaTiO3 films increased with decreasing total pressure. BaTiO3 film in thickness of about 1 μm had a relative dielectric constant of 480. The dielectric constant of the BaTiO3 film showed the maximum value of 530 at 360 K.",

keywords = "Barium titanate, Dielectric constant, Metal-organic chemical vapor deposition, Thermodynamic analysis, Thin film",

author = "T. Tohma and H. Masumoto and T. Hirai and T. Goto",

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doi = "10.2320/matertrans.42.702",

language = "English",

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pages = "702--706",

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T1 - Preparation of barium titanate film by metal-organic chemical vapor deposition and its thermodynamic analysis

AU - Tohma, T.

AU - Masumoto, H.

AU - Hirai, T.

AU - Goto, T.

PY - 2001

Y1 - 2001

N2 - BaTiO3 films were prepared on fused silica substrates by metal-organic chemical vapor deposition (MOCVD). Effect of deposition conditions on the composition, structure and morphology were studied. Thermodynamic calculations well predicted the relationship between deposition conditions and the phases of deposits. BaTiO3 films in a single phase were obtained at 973 K and Ba/Ti ratio in the source gas of 0.25 to 0.35. The grain size of BaTiO3 films increased with decreasing total pressure. BaTiO3 film in thickness of about 1 μm had a relative dielectric constant of 480. The dielectric constant of the BaTiO3 film showed the maximum value of 530 at 360 K.

AB - BaTiO3 films were prepared on fused silica substrates by metal-organic chemical vapor deposition (MOCVD). Effect of deposition conditions on the composition, structure and morphology were studied. Thermodynamic calculations well predicted the relationship between deposition conditions and the phases of deposits. BaTiO3 films in a single phase were obtained at 973 K and Ba/Ti ratio in the source gas of 0.25 to 0.35. The grain size of BaTiO3 films increased with decreasing total pressure. BaTiO3 film in thickness of about 1 μm had a relative dielectric constant of 480. The dielectric constant of the BaTiO3 film showed the maximum value of 530 at 360 K.

KW - Barium titanate

KW - Dielectric constant

KW - Metal-organic chemical vapor deposition

KW - Thermodynamic analysis

KW - Thin film

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Preparation of barium titanate film by metal-organic chemical vapor deposition and its thermodynamic analysis

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Keywords

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