Abstract
Ca-Ti-O and Ca-P-O films were prepared by MOCVD. The phases, composition and morphology of Ca-Ti-O and Ca-P-O films changed depending on the molar ratio of Ca to Ti (RCa/Ti) and Ca to P (RCa/P) precursors, total pressure (Ptot) and substrate temperature (Tsub). CaTiO3 films in a single phase were obtained at Tsub=973 and 1073 K. CaTiO3 films prepared at Tsub= 873 K had a dense and smooth surface. CaTiO3 films prepared at Tsub= 1073 K had complicated rough surface with a cauliflower-like texture. α-TCP and HAp films in a single phase were obtained at Tsub, = 973 and 1073 K, and both films had dense microstructure. Apatite formed after 3 days on the CaTiO3 film, while 14 days on the a-TCP film and 6 hours on the HAp film, respectively. Functionally graded Ca-Ti-O/Ca-P-O films were successfully prepared by MOCVD, and expected to have good bone conductivity and adherence to Ti substrate.
Original language | English |
---|---|
Pages (from-to) | 325-330 |
Number of pages | 6 |
Journal | Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy |
Volume | 55 |
Issue number | 5 |
DOIs | |
Publication status | Published - 2008 May |
Keywords
- CaTiO
- HAp
- Hanks' solution
- Metal-organic chemical vapor deposition
- α-TCP
ASJC Scopus subject areas
- Mechanical Engineering
- Industrial and Manufacturing Engineering
- Metals and Alloys
- Materials Chemistry