TY - JOUR
T1 - Preparation of self-organized mesoscale polymer patterns on a solid substrate
T2 - Continuous pattern formation from a receding meniscus
AU - Yabu, Hiroshi
AU - Shimomura, Masatsugu
PY - 2005/4
Y1 - 2005/4
N2 - Regular polymer patterns are formed from casting a dilute polymer solution on a solid substrate. Dissipative structures, e.g., convection patterns, fingering instabilities, and so on, are formed in the evaporation process of casting polymer films. Controlled production and manufacturing of patterned polymer films can be achieved when the evaporating solution edge, especially the meniscus region on the casting substrate, is formed under controlled casting conditions. In this report, we describe a computer-controlled apparatus which has two precisely manipulated sliding glass plates. A narrow, thin liquid film of polymer solution with a receding meniscus is continuously supplied from a small gap between two glass plates (one sliding and the other stationary), and a patterned polymer film is subsequently formed on the stationary substrate from the evaporating solution edge. Several types of polymer patterns from various polymers are reproducibly prepared by changing preparation conditions such as sliding speed and polymer concentration.
AB - Regular polymer patterns are formed from casting a dilute polymer solution on a solid substrate. Dissipative structures, e.g., convection patterns, fingering instabilities, and so on, are formed in the evaporation process of casting polymer films. Controlled production and manufacturing of patterned polymer films can be achieved when the evaporating solution edge, especially the meniscus region on the casting substrate, is formed under controlled casting conditions. In this report, we describe a computer-controlled apparatus which has two precisely manipulated sliding glass plates. A narrow, thin liquid film of polymer solution with a receding meniscus is continuously supplied from a small gap between two glass plates (one sliding and the other stationary), and a patterned polymer film is subsequently formed on the stationary substrate from the evaporating solution edge. Several types of polymer patterns from various polymers are reproducibly prepared by changing preparation conditions such as sliding speed and polymer concentration.
UR - http://www.scopus.com/inward/record.url?scp=17144363525&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=17144363525&partnerID=8YFLogxK
U2 - 10.1002/adfm.200400315
DO - 10.1002/adfm.200400315
M3 - Article
AN - SCOPUS:17144363525
SN - 1616-301X
VL - 15
SP - 575
EP - 581
JO - Advanced Functional Materials
JF - Advanced Functional Materials
IS - 4
ER -