TY - JOUR
T1 - Pressure dependence of the OH-stretching mode in F-rich natural topaz and topaz-OH
AU - Komatsu, K.
AU - Kagi, H.
AU - Okada, T.
AU - Kuribayashi, T.
AU - Parise, J. B.
AU - Kudoh, Y.
PY - 2005/1
Y1 - 2005/1
N2 - OH stretching vibration modes for F-rich natural topaz (F-topaz) and for fully hydrated topaz (topaz-OH) synthesized at high pressure, were observed using IR and Raman spectroscopies at pressures up to 30.4 GPa and 17.3 GPa, respectively. In F-topaz, the pressure derivative of the frequency of the OH stretching band observed at 3650 cm-1 at ambient pressure was 0.91(3) cm-1/GPa, which was consistent with the value recently reported by Bradbury and Williams (2003). On the other hand, in topaz-OH, the pressure derivatives of the bands initially at 3599 and 3522 cm-1 were -5.2(2) and -2.56(6) cm -1/GPa, respectively. This contrasting behavior between the two forms of topaz at high pressures suggests that the OH substitution for F in topaz affects the hydrogen-bonding behavior under high pressure.
AB - OH stretching vibration modes for F-rich natural topaz (F-topaz) and for fully hydrated topaz (topaz-OH) synthesized at high pressure, were observed using IR and Raman spectroscopies at pressures up to 30.4 GPa and 17.3 GPa, respectively. In F-topaz, the pressure derivative of the frequency of the OH stretching band observed at 3650 cm-1 at ambient pressure was 0.91(3) cm-1/GPa, which was consistent with the value recently reported by Bradbury and Williams (2003). On the other hand, in topaz-OH, the pressure derivatives of the bands initially at 3599 and 3522 cm-1 were -5.2(2) and -2.56(6) cm -1/GPa, respectively. This contrasting behavior between the two forms of topaz at high pressures suggests that the OH substitution for F in topaz affects the hydrogen-bonding behavior under high pressure.
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U2 - 10.2138/am.2005.1652
DO - 10.2138/am.2005.1652
M3 - Article
AN - SCOPUS:12444299018
SN - 0003-004X
VL - 90
SP - 266
EP - 270
JO - American Mineralogist
JF - American Mineralogist
IS - 1
ER -