TY - GEN
T1 - Print and imprint method for nanoimprint lithography with high-viscosity photo-curable resins
AU - Nakamura, T.
AU - Nakagawa, M.
N1 - Publisher Copyright:
© 2017 Japan Institute of Electronics Packaging.
PY - 2017/6/5
Y1 - 2017/6/5
N2 - Ultraviolet nanoimprint lithography (UV-NIL) has become one of advanced pattering methods for fabrication of micro-and nano-structures over several inches by replication with designed mold patterns at high throughput and low cost. For practical application of UV-NIL, it is essential to eliminate bubble defects and to make residual layer thicknesses (RLTs) of a fabricated resist pattern uniform after the imprint process for subsequent dry-etching processes. We demonstrated the high-viscosity UV-curable resin (viscosity=12,800 mPas) suitable for bubble-defect-free UV nanoimprinting in a condensable gas atmosphere. We enabled to deposit droplets of the high-viscosity resin on a substrate by screen printing with a through-hole membrane with the volume of sub-pico liter. The method was effective for leveling RLTs in bubble-defect-free UV-NIL. In the present study, we give an overview of 'Print and Imprint' method comprising screen printing and UV-NIL, and demonstrate the position-selective placement of high-viscosity resin droplets by screen printing.
AB - Ultraviolet nanoimprint lithography (UV-NIL) has become one of advanced pattering methods for fabrication of micro-and nano-structures over several inches by replication with designed mold patterns at high throughput and low cost. For practical application of UV-NIL, it is essential to eliminate bubble defects and to make residual layer thicknesses (RLTs) of a fabricated resist pattern uniform after the imprint process for subsequent dry-etching processes. We demonstrated the high-viscosity UV-curable resin (viscosity=12,800 mPas) suitable for bubble-defect-free UV nanoimprinting in a condensable gas atmosphere. We enabled to deposit droplets of the high-viscosity resin on a substrate by screen printing with a through-hole membrane with the volume of sub-pico liter. The method was effective for leveling RLTs in bubble-defect-free UV-NIL. In the present study, we give an overview of 'Print and Imprint' method comprising screen printing and UV-NIL, and demonstrate the position-selective placement of high-viscosity resin droplets by screen printing.
KW - laser drilling
KW - screen printing
KW - UV nanoimprint lithography (UV-NIL)
KW - UV-curable resin
UR - http://www.scopus.com/inward/record.url?scp=85021406179&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85021406179&partnerID=8YFLogxK
U2 - 10.23919/ICEP.2017.7939415
DO - 10.23919/ICEP.2017.7939415
M3 - Conference contribution
AN - SCOPUS:85021406179
T3 - 2017 International Conference on Electronics Packaging, ICEP 2017
SP - 443
EP - 446
BT - 2017 International Conference on Electronics Packaging, ICEP 2017
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 2017 International Conference on Electronics Packaging, ICEP 2017
Y2 - 19 April 2017 through 22 April 2017
ER -