Production and application of reactive plasmas using helicon-wave discharge in very low magnetic fields

G. Sato; T. Kato; W. Oohara; R. Hatakeyama

doi:10.1016/j.tsf.2005.08.049

Production and application of reactive plasmas using helicon-wave discharge in very low magnetic fields

G. Sato, T. Kato, W. Oohara, R. Hatakeyama

ENG - Electronic Engineering

Tohoku University

Research output: Contribution to journal › Article › peer-review

9 Citations (Scopus)

Abstract

In order to explore new application fields of a helicon-wave discharge, we have investigated the production of helicon-wave plasmas in very low magnetic fields (0-10 mT) and the resultant nanocarbon creation using methane and/or hydrogen. The reactive plasmas are effectively produced by the helicon wave around 3 mT independently of gas species in the wide range of pressures (0.1-10 Pa), where hydrocarbons and atomic hydrogens are generated. Using the helicon-wave reactive plasma as a precursor source for plasma-enhanced chemical vapor deposition, well-aligned carbon nanotubes and nanowalls are found to be formed even in a very low gas pressure of 0.7 Pa.

Original language	English
Pages (from-to)	550-554
Number of pages	5
Journal	Thin Solid Films
Volume	506-507
DOIs	https://doi.org/10.1016/j.tsf.2005.08.049
Publication status	Published - 2006 May 26

Keywords

Carbon
Helicon-wave discharge
Nanostructures
Plasma enhanced chemical vapor deposition

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10.1016/j.tsf.2005.08.049

Cite this

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title = "Production and application of reactive plasmas using helicon-wave discharge in very low magnetic fields",

abstract = "In order to explore new application fields of a helicon-wave discharge, we have investigated the production of helicon-wave plasmas in very low magnetic fields (0-10 mT) and the resultant nanocarbon creation using methane and/or hydrogen. The reactive plasmas are effectively produced by the helicon wave around 3 mT independently of gas species in the wide range of pressures (0.1-10 Pa), where hydrocarbons and atomic hydrogens are generated. Using the helicon-wave reactive plasma as a precursor source for plasma-enhanced chemical vapor deposition, well-aligned carbon nanotubes and nanowalls are found to be formed even in a very low gas pressure of 0.7 Pa.",

keywords = "Carbon, Helicon-wave discharge, Nanostructures, Plasma enhanced chemical vapor deposition",

author = "G. Sato and T. Kato and W. Oohara and R. Hatakeyama",

note = "Funding Information: The authors thank H. Ishida, T. Hirata, K. Tohji, and K. Motomiya for technical supports. This work was supported by the Sasakawa Scientific Research Grant from The Japan Science Society and Tohoku University 21st Century COE (Center of Excellence) Program.",

year = "2006",

month = may,

day = "26",

doi = "10.1016/j.tsf.2005.08.049",

language = "English",

volume = "506-507",

pages = "550--554",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

}

TY - JOUR

T1 - Production and application of reactive plasmas using helicon-wave discharge in very low magnetic fields

AU - Sato, G.

AU - Kato, T.

AU - Oohara, W.

AU - Hatakeyama, R.

N1 - Funding Information: The authors thank H. Ishida, T. Hirata, K. Tohji, and K. Motomiya for technical supports. This work was supported by the Sasakawa Scientific Research Grant from The Japan Science Society and Tohoku University 21st Century COE (Center of Excellence) Program.

PY - 2006/5/26

Y1 - 2006/5/26

N2 - In order to explore new application fields of a helicon-wave discharge, we have investigated the production of helicon-wave plasmas in very low magnetic fields (0-10 mT) and the resultant nanocarbon creation using methane and/or hydrogen. The reactive plasmas are effectively produced by the helicon wave around 3 mT independently of gas species in the wide range of pressures (0.1-10 Pa), where hydrocarbons and atomic hydrogens are generated. Using the helicon-wave reactive plasma as a precursor source for plasma-enhanced chemical vapor deposition, well-aligned carbon nanotubes and nanowalls are found to be formed even in a very low gas pressure of 0.7 Pa.

AB - In order to explore new application fields of a helicon-wave discharge, we have investigated the production of helicon-wave plasmas in very low magnetic fields (0-10 mT) and the resultant nanocarbon creation using methane and/or hydrogen. The reactive plasmas are effectively produced by the helicon wave around 3 mT independently of gas species in the wide range of pressures (0.1-10 Pa), where hydrocarbons and atomic hydrogens are generated. Using the helicon-wave reactive plasma as a precursor source for plasma-enhanced chemical vapor deposition, well-aligned carbon nanotubes and nanowalls are found to be formed even in a very low gas pressure of 0.7 Pa.

KW - Carbon

KW - Helicon-wave discharge

KW - Nanostructures

KW - Plasma enhanced chemical vapor deposition

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U2 - 10.1016/j.tsf.2005.08.049

DO - 10.1016/j.tsf.2005.08.049

M3 - Article

AN - SCOPUS:33645237774

SN - 0040-6090

VL - 506-507

SP - 550

EP - 554

JO - Thin Solid Films

JF - Thin Solid Films

ER -

Production and application of reactive plasmas using helicon-wave discharge in very low magnetic fields

Abstract

Keywords

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