Progress on the magnetic field-assisted finishing of MEMS micropore X-ray optics

Raul E. Riveros, Michael A. Tan, Hitomi Yamaguchi, Ikuyuki Mitsuishi, Kensuke Ishizu, Teppei Moriyama, Tomohiro Ogawa, Yuichiro Ezoe, Mitsuhiro Horade, Susumu Sugiyama, Yoshiaki Kanamori, Noriko Yamasaki, Kazuhisa Mitsuda

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Citations (Scopus)


Microelectromechanical systems (MEMS) micropore X-ray optics were proposed as an ultralightweight, high- resolution, and low cost X-ray focusing optic alternative to the large, heavy and expensive optic systems in use today. The optic's monolithic design which includes high-aspect-ratio curvilinear micropores with minimal sidewall roughness is challenging to fabricate. When made by either deep reactive ion etching or X-ray LIGA, the micropore sidewalls (re ecting surfaces) exhibit unacceptably high surface roughness. A magnetic eld-assisted nishing (MAF) process was proposed to reduce the micropore sidewall roughness of MEMS micropore optics and improvements in roughness have been reported. At this point, the best surface roughness achieved is ∼3 nm Rq on nickel optics and ∼0.2 nm Rq on silicon optics. These improvements bring MEMS micropore optics closer to their realization as functional X-ray optics. This paper details the manufacturing and post-processing of MEMS micropore X-ray optics including results of recent polishing experiments with MAF.

Original languageEnglish
Title of host publicationOptics for EUV, X-Ray, and Gamma-Ray Astronomy V
Publication statusPublished - 2011
EventOptics for EUV, X-Ray, and Gamma-Ray Astronomy V - San Diego, CA, United States
Duration: 2011 Aug 232011 Aug 25

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X


ConferenceOptics for EUV, X-Ray, and Gamma-Ray Astronomy V
Country/TerritoryUnited States
CitySan Diego, CA


  • MAF
  • MEMS
  • Micropore
  • Polishing
  • X-ray optics


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