Abstract
In this study, a new nonvolatile memory with magnetic nano-dots (MNDs) was proposed. A relatively large anisotropic change of gate current-voltage characteristics by the magnetization in magnetic non-volatile memory with Co nano floating gate and Ni-Fe control gate was obtained. A Co magnetic nano-dot film with very high dot density of 2 × 1013 cm-2 was successfully formed by sputtering with optimized target composition. A small anisotropic change of gate current-voltage characteristics by the magnetization in MND memory with Co MNDs and Ni-Fe control gate was observed.
Original language | English |
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Pages (from-to) | 2203-2206 |
Number of pages | 4 |
Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
Volume | 43 |
Issue number | 4 B |
DOIs | |
Publication status | Published - 2004 Apr |
Externally published | Yes |
Keywords
- Carrier tunneling probability
- MND
- Magnetic floating gate
- Ni-Fe control gate
- Retention characteristic
ASJC Scopus subject areas
- Engineering(all)
- Physics and Astronomy(all)