TY - JOUR
T1 - Quantitative Analysis of Nanoscale Step Dynamics in High-Temperature Solution-Grown Single Crystal 4H-SiC via in Situ Confocal Laser Scanning Microscope
AU - Onuma, Aomi
AU - Maruyama, Shingo
AU - Komatsu, Naoyoshi
AU - Mitani, Takeshi
AU - Kato, Tomohisa
AU - Okumura, Hajime
AU - Matsumoto, Yuji
N1 - Publisher Copyright:
© 2017 American Chemical Society.
PY - 2017/5/3
Y1 - 2017/5/3
N2 - Nanoscale understanding of high-temperature crystal growth dynamics in solution has been a challenge to be tackled by many researchers engaged in investigating solution processes for bulk single crystal growth. Here we propose a new approach to in situ observation at a buried solid/liquid interface in high-temperature solution using a conventional confocal laser scanning microscope. In the solution growth of 4H-SiC with Si-Ni based alloy flux as a model system, we show the ability to quantitatively analyze step motions at the growing SiC crystal on the nanoscale at high temperatures up to 1700 °C in a vacuum. The temperature-dependent step-advance rates for various steps with different step heights demonstrated the advantageous effect of adding Al to the flux on the step-flow growth of SiC: addition of just 4 at% Al effectively suppressed step-bunching. These experiments point to the importance of in situ nanoscale observation in understanding solution growth mechanisms, and hence the potential to accelerate the development of solution growth processes for high-quality bulk single crystals.
AB - Nanoscale understanding of high-temperature crystal growth dynamics in solution has been a challenge to be tackled by many researchers engaged in investigating solution processes for bulk single crystal growth. Here we propose a new approach to in situ observation at a buried solid/liquid interface in high-temperature solution using a conventional confocal laser scanning microscope. In the solution growth of 4H-SiC with Si-Ni based alloy flux as a model system, we show the ability to quantitatively analyze step motions at the growing SiC crystal on the nanoscale at high temperatures up to 1700 °C in a vacuum. The temperature-dependent step-advance rates for various steps with different step heights demonstrated the advantageous effect of adding Al to the flux on the step-flow growth of SiC: addition of just 4 at% Al effectively suppressed step-bunching. These experiments point to the importance of in situ nanoscale observation in understanding solution growth mechanisms, and hence the potential to accelerate the development of solution growth processes for high-quality bulk single crystals.
UR - http://www.scopus.com/inward/record.url?scp=85018956360&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85018956360&partnerID=8YFLogxK
U2 - 10.1021/acs.cgd.7b00325
DO - 10.1021/acs.cgd.7b00325
M3 - Article
AN - SCOPUS:85018956360
SN - 1528-7483
VL - 17
SP - 2844
EP - 2851
JO - Crystal Growth and Design
JF - Crystal Growth and Design
IS - 5
ER -