TY - JOUR
T1 - Quick X-ray reflectometry in the simultaneous multiple angle-wavelength dispersive mode
AU - Arakawa, E.
AU - Voegeli, W.
AU - Matsushita, T.
AU - Yano, Y. F.
AU - Hatano, T.
PY - 2013
Y1 - 2013
N2 - The whole profile of the specular X-ray reflectivity curve was simultaneously and quickly measured with no need to rotate the specimen, the detector or the monochromator crystal. A white synchrotron beam from a bending magnet source is incident on a bent-twisted silicon (111) crystal polychromator that produces a convergent X-ray beam with a continuously varying wavelength (energy) and glancing angle to the specimen surface. This convergent X-ray beam was specularly reflected in the vertical direction by the specimen placed at the focus. The normalized spatial distribution across the beam direction of the reflected beam represents a specular X-ray reflectivity curve because each position along the line recorded on the two dimensional detector surface corresponds to a different momentum transfer. Reflectivity curves from a (001) silicon wafer, a nickel thin film on a silicon substrate, and a water surface were measured with data collection times of 0.001-100 s, 0.01-100 s, and 1.0-1000 s, respectively. The simultaneously covered momentum transfer range was 0.03-0.52 Å-1 for solid specimens and 0-0.41 Å-1 for liquid specimen.
AB - The whole profile of the specular X-ray reflectivity curve was simultaneously and quickly measured with no need to rotate the specimen, the detector or the monochromator crystal. A white synchrotron beam from a bending magnet source is incident on a bent-twisted silicon (111) crystal polychromator that produces a convergent X-ray beam with a continuously varying wavelength (energy) and glancing angle to the specimen surface. This convergent X-ray beam was specularly reflected in the vertical direction by the specimen placed at the focus. The normalized spatial distribution across the beam direction of the reflected beam represents a specular X-ray reflectivity curve because each position along the line recorded on the two dimensional detector surface corresponds to a different momentum transfer. Reflectivity curves from a (001) silicon wafer, a nickel thin film on a silicon substrate, and a water surface were measured with data collection times of 0.001-100 s, 0.01-100 s, and 1.0-1000 s, respectively. The simultaneously covered momentum transfer range was 0.03-0.52 Å-1 for solid specimens and 0-0.41 Å-1 for liquid specimen.
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U2 - 10.1088/1742-6596/425/9/092002
DO - 10.1088/1742-6596/425/9/092002
M3 - Conference article
AN - SCOPUS:84876211019
SN - 1742-6588
VL - 425
JO - Journal of Physics: Conference Series
JF - Journal of Physics: Conference Series
IS - PART 9
M1 - 092002
T2 - 11th International Conference on Synchrotron Radiation Instrumentation, SRI 2012
Y2 - 9 July 2012 through 13 July 2012
ER -