TY - JOUR
T1 - Radiation-Induced Chemical Dynamics in Ar Clusters Exposed to Strong X-Ray Pulses
AU - Kumagai, Yoshiaki
AU - Jurek, Zoltan
AU - Xu, Weiqing
AU - Fukuzawa, Hironobu
AU - Motomura, Koji
AU - Iablonskyi, Denys
AU - Nagaya, Kiyonobu
AU - Wada, Shin Ichi
AU - Mondal, Subhendu
AU - Tachibana, Tetsuya
AU - Ito, Yuta
AU - Sakai, Tsukasa
AU - Matsunami, Kenji
AU - Nishiyama, Toshiyuki
AU - Umemoto, Takayuki
AU - Nicolas, Christophe
AU - Miron, Catalin
AU - Togashi, Tadashi
AU - Ogawa, Kanade
AU - Owada, Shigeki
AU - Tono, Kensuke
AU - Yabashi, Makina
AU - Son, Sang Kil
AU - Ziaja, Beata
AU - Santra, Robin
AU - Ueda, Kiyoshi
N1 - Funding Information:
We are grateful to the late Makoto Yao for his invaluable contributions to the present work. The experiments were performed at SACLA with the approval of JASRI and the program review committee (No. 2014A8040). This study was supported by the X-ray Free Electron Laser Utilization Research Project and the X-ray Free Electron Laser Priority Strategy Program of the Ministry of Education, Culture, Sports, Science and Technology of Japan (MEXT), by the Proposal Program of SACLA Experimental Instruments of RIKEN, by the Japan Society for the Promotion of Science (JSPS) KAKENHI Grants No. JP21244042, No. JP23241033, No. JP15K17487, and No. JP16K05016, by MEXT KAKENHI Grant No. JP22740264, by the IMRAM project, and by the National Nature Science Foundation of China (Grant No. 11604003). H. F. and K. U. acknowledge Dynamic Alliance for Open Innovation Bridging Human, Environment and Materials. K. N. and S. W. acknowledge the Research Program of “Dynamic Alliance for Open Innovation Bridging Human, Environment and Materials” in “Network Joint Research Center for Materials and Devices.” S. M. acknowledges JSPS KAKENHI Grant No. JP11F01028. T. N. acknowledges the Research Program for Next Generation Young Scientists of “Dynamic Alliance for Open Innovation Bridging Human, Environment and Materials” in “Network Joint Research Center for Materials and Devices.” D. I. and Y. I. acknowledge IMRAM, Tohoku University.
Publisher Copyright:
© 2018 American Physical Society.
PY - 2018/5/31
Y1 - 2018/5/31
N2 - We show that electron and ion spectroscopy reveals the details of the oligomer formation in Ar clusters exposed to an x-ray free electron laser (XFEL) pulse, i.e., chemical dynamics triggered by x rays. With guidance from a dedicated molecular dynamics simulation tool, we find that van der Waals bonding, the oligomer formation mechanism, and charge transfer among the cluster constituents significantly affect ionization dynamics induced by an XFEL pulse of moderate fluence. Our results clearly demonstrate that XFEL pulses can be used not only to "damage and destroy" molecular assemblies but also to modify and transform their molecular structure. The accuracy of the predictions obtained makes it possible to apply the cluster spectroscopy, in connection with the respective simulations, for estimation of the XFEL pulse fluence in the fluence regime below single-atom multiple-photon absorption, which is hardly accessible with other diagnostic tools.
AB - We show that electron and ion spectroscopy reveals the details of the oligomer formation in Ar clusters exposed to an x-ray free electron laser (XFEL) pulse, i.e., chemical dynamics triggered by x rays. With guidance from a dedicated molecular dynamics simulation tool, we find that van der Waals bonding, the oligomer formation mechanism, and charge transfer among the cluster constituents significantly affect ionization dynamics induced by an XFEL pulse of moderate fluence. Our results clearly demonstrate that XFEL pulses can be used not only to "damage and destroy" molecular assemblies but also to modify and transform their molecular structure. The accuracy of the predictions obtained makes it possible to apply the cluster spectroscopy, in connection with the respective simulations, for estimation of the XFEL pulse fluence in the fluence regime below single-atom multiple-photon absorption, which is hardly accessible with other diagnostic tools.
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U2 - 10.1103/PhysRevLett.120.223201
DO - 10.1103/PhysRevLett.120.223201
M3 - Article
C2 - 29906148
AN - SCOPUS:85048320260
SN - 0031-9007
VL - 120
JO - Physical Review Letters
JF - Physical Review Letters
IS - 22
M1 - 223201
ER -