Silicon suboxide (SiO x) could be a potential material for radiative cooling due to appropriate infra-red absorption at wave-length (λ) between 8 and 13 μm. In this study, SiO x films ranging from x = 0.98 to 1.7 were prepared by magnetron sputtering using a SiO sintered body target. An SiO 0.98 single layer film had a relatively sharp absorption peak at λ = 10 μm. The obtained SiO 0.98 film showed amorphous and a black-brown color. An optical band gap (E g) of the SiO 0.98 film was 3.6eV, and the SiO x (x > 1.4) film was transparent in the UV-visible range with a wide optical band gap (> 4 eV). A functionally graded SiO x layers showed broader absorption from λ = 8 to 13 μm, promising for radiative cooling.
|Translated title of the contribution||Radiative cooling characteristics of functionally graded silicon suboxide films prepared by magnetron sputtering|
|Number of pages||6|
|Journal||Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy|
|Publication status||Published - 2005 Nov|