Radio frequency ion source operated with field effect transistor based radio frequency system

A. Ando; A. Komuro; T. Matsuno; K. Tsumori; Y. Takeiri

doi:10.1063/1.3279306

Radio frequency ion source operated with field effect transistor based radio frequency system

A. Ando, A. Komuro, T. Matsuno, K. Tsumori, Y. Takeiri

ENG - Electrical Engineering

Research output: Contribution to journal › Article › peer-review

15 Citations (Scopus)

Abstract

Characteristics of radio frequency (RF) plasma production are investigated using a field effect transistor inverter power supply as an RF wave source. With the frequency of around 0.3 MHz, an electron density over 1018 m^-3 is produced in argon plasma. Although lower densities are obtained in hydrogen plasma, it drastically increased up to 5× 10¹⁸ m^-3 with an axial magnetic field of around 100 G applied in the driver region. Effects of the magnetic field and gas pressure are investigated in the RF produced plasma with the frequency of several hundred kilohertz.

Original language	English
Article number	02B107
Journal	Review of Scientific Instruments
Volume	81
Issue number	2
DOIs	https://doi.org/10.1063/1.3279306
Publication status	Published - 2010

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10.1063/1.3279306

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title = "Radio frequency ion source operated with field effect transistor based radio frequency system",

abstract = "Characteristics of radio frequency (RF) plasma production are investigated using a field effect transistor inverter power supply as an RF wave source. With the frequency of around 0.3 MHz, an electron density over 1018 m-3 is produced in argon plasma. Although lower densities are obtained in hydrogen plasma, it drastically increased up to 5× 1018 m-3 with an axial magnetic field of around 100 G applied in the driver region. Effects of the magnetic field and gas pressure are investigated in the RF produced plasma with the frequency of several hundred kilohertz.",

author = "A. Ando and A. Komuro and T. Matsuno and K. Tsumori and Y. Takeiri",

note = "Funding Information: This work was supported under the auspices of the NIFS Collaborative Research Program (NIFS07 KOAB010) and NIFS/NINS under the project of Formation of International Network for Scientific Collaborations. ",

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doi = "10.1063/1.3279306",

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AU - Ando, A.

AU - Komuro, A.

AU - Matsuno, T.

AU - Tsumori, K.

AU - Takeiri, Y.

N1 - Funding Information: This work was supported under the auspices of the NIFS Collaborative Research Program (NIFS07 KOAB010) and NIFS/NINS under the project of Formation of International Network for Scientific Collaborations.

PY - 2010

Y1 - 2010

N2 - Characteristics of radio frequency (RF) plasma production are investigated using a field effect transistor inverter power supply as an RF wave source. With the frequency of around 0.3 MHz, an electron density over 1018 m-3 is produced in argon plasma. Although lower densities are obtained in hydrogen plasma, it drastically increased up to 5× 1018 m-3 with an axial magnetic field of around 100 G applied in the driver region. Effects of the magnetic field and gas pressure are investigated in the RF produced plasma with the frequency of several hundred kilohertz.

AB - Characteristics of radio frequency (RF) plasma production are investigated using a field effect transistor inverter power supply as an RF wave source. With the frequency of around 0.3 MHz, an electron density over 1018 m-3 is produced in argon plasma. Although lower densities are obtained in hydrogen plasma, it drastically increased up to 5× 1018 m-3 with an axial magnetic field of around 100 G applied in the driver region. Effects of the magnetic field and gas pressure are investigated in the RF produced plasma with the frequency of several hundred kilohertz.

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JF - Review of Scientific Instruments

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ER -

Radio frequency ion source operated with field effect transistor based radio frequency system

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