TY - JOUR
T1 - Rapid deposition of (K,Na)NbO3thick films using microwave-assisted hydrothermal technique
AU - Uchida, Hiroshi
AU - Okura, Masaki
AU - Ito, Yoshiharu
AU - Shiraishi, Takahisa
AU - Kiguchi, Takanori
AU - Konno, Toyohiko J.
AU - Funakubo, Hiroshi
N1 - Publisher Copyright:
© 2020 The Japan Society of Applied Physics.
PY - 2020/11/1
Y1 - 2020/11/1
N2 - Rapid processing for hydrothermal deposition of (K,Na)NbO3 (KNN) thick films was proposed with the assistance of microwave (MW) heating, for short-time fabrication of ferroelectric/piezoelectric films with thicknesses of several micrometers within 1 h. MW irradiation raised the temperature of water medium up to 240 ?C within 10 min, whereas conventional heating using hot-air convection required more than 2 h. Epitaxial KNN films were successfully deposited on single-crystal substrates of (100)SrTiO3:Nb and (100)SrRuO3//(100)SrTiO3 at reaction temperature of 180 ?C-240 ?C within 1 h; especially, the films with thicknesses over 10 μm could be obtained on at 220 ?C for 40 min. The resulting film exhibited domain structure and dielectric/ferroelectric properties comparable with the KNN films derived from conventional hydrothermal deposition.
AB - Rapid processing for hydrothermal deposition of (K,Na)NbO3 (KNN) thick films was proposed with the assistance of microwave (MW) heating, for short-time fabrication of ferroelectric/piezoelectric films with thicknesses of several micrometers within 1 h. MW irradiation raised the temperature of water medium up to 240 ?C within 10 min, whereas conventional heating using hot-air convection required more than 2 h. Epitaxial KNN films were successfully deposited on single-crystal substrates of (100)SrTiO3:Nb and (100)SrRuO3//(100)SrTiO3 at reaction temperature of 180 ?C-240 ?C within 1 h; especially, the films with thicknesses over 10 μm could be obtained on at 220 ?C for 40 min. The resulting film exhibited domain structure and dielectric/ferroelectric properties comparable with the KNN films derived from conventional hydrothermal deposition.
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U2 - 10.35848/1347-4065/aba50e
DO - 10.35848/1347-4065/aba50e
M3 - Article
AN - SCOPUS:85090052649
SN - 0021-4922
VL - 59
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - SP
M1 - SPPB02
ER -