@inproceedings{2da9fc7156254c35b4f17a5218c659e6,
title = "Reactive force-field molecular dynamics study of sige thin film growth in plasma enhanced chemical vapor deposition processes",
abstract = "The SiGe thin films, such as hydrogenated amorphous SiGe (a-SiGe:H) and hydrogenated microcrystalline SiGe (μc-SiGe:H), are known as a potential material. In order to form promising SiGe thin films using chemical vapor deposition, relationship between materials/process and structure/composition should be clarified at the atomic level. We analyzed the influence of the substrate temperature and the ratio of SiH3 and GeH3, which are considered to be the dominant gaseous species on the deposition, on the crystallinity and atomic content in SiGe thin films by reactive force-field molecular dynamics simulations. The crystallinity increased as the substrate temperature increased, and the lowest crystallinity was obtained when the ratio of SiH3 and GeH3 is approximately 0.5. The hydrogen content decreased as the substrate temperature increased, while silicon and germanium content tended to increase as substrate temperature increased. These results were in good agreement with relevant studies.",
author = "N. Uene and T. Mabuchi and M. Zaitsu and S. Yasuhara and T. Tokumasu",
note = "Funding Information: This work was supported by JSPS Grant-in-Aid for JSPS Research Fellow Grant Number JP20J20915. Numerical simulations were performed on the Supercomputer system {"}AFI-NITY{"} at the Advanced Fluid Information Research Center, Institute of Fluid Science, Tohoku University. Publisher Copyright: {\textcopyright} The Electrochemical Society; Pacific Rim Meeting on Electrochemical and Solid State Science 2020, PRiME 200 ; Conference date: 04-10-2020 Through 09-10-2020",
year = "2020",
doi = "10.1149/09805.0177ecst",
language = "English",
series = "ECS Transactions",
publisher = "IOP Publishing Ltd.",
number = "5",
pages = "177--184",
editor = "Q. Liu and Hartmann, {J. M.} and Holt, {J. R.} and X. Gong and V. Jain and G. Niu and G. Masini and A. Ogura and S. Miyazaki and M. Ostling and W. Bi and A. Schulze and A. Mai",
booktitle = "PRiME 2020",
address = "United Kingdom",
edition = "5",
}