Reduction of interfacial SiO2 at HfO2/Si interface with Ta2O5 cap

Kazuyoshi Kobashi, Takahiro Nagata, Atsushi Ogura, Toshihide Nabatame, Toyohiro Chikyow

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Reduction of interfacial SiO2 at HfO2/Si interface with Ta2O5 cap'. Together they form a unique fingerprint.

Engineering

Material Science