Abstract
The relationship between gallium (Ga) concentration and resistivity was studied in Ga-doped Czochralski (CZ) silicon (Si) single crystals in the dopant concentration range from 1 × 1014 to 2 × 1018 atoms/cm3 by the four-point probe method, inductively coupled plasma (ICP) analysis, and Hall-effect measurement. The resistivity of Ga-doped Si was found to be larger than that of B-doped Si, because Ga is not fully ionized at Ga concentrations higher than 1016 atoms/cm3 at 300 K. A conversion curve from resistivity to Ga concentration in the range from 1 × 1014 to 1 × 1017 atoms/cm3 is proposed.
Original language | English |
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Pages (from-to) | 8691-8695 |
Number of pages | 5 |
Journal | Japanese Journal of Applied Physics |
Volume | 47 |
Issue number | 12 |
DOIs | |
Publication status | Published - 2008 Dec 19 |
Keywords
- Acceptor concentration
- Conductivity mobility
- Conversion curve
- CZ-si crystal
- Ga concentration
- Ga-doped silicon
- Resistivity
- Solar cell