TY - JOUR
T1 - Remind again; Quality of thin film fabrication process
AU - Saito, Shin
AU - Takasaki, Michitaka
AU - Ishibashi, Shinichi
AU - Ashizawa, Yoshito
AU - Onodera, Masanobu
AU - Takahashi, Migaku
PY - 2010
Y1 - 2010
N2 - Concept of ultra clean (UC) dry-process proposed by present authors in 1990s has been widely used in various thin film fabrication fields from the view point of research as well as volume production stages of electronic devices. Original basic concept for UC-process sometimes are lead to another wrong concept direction, usually caused by a compromise for temporal trial, space limitation, facility, and so on. In this paper, UC technological items originally proposed is briefly reviewed. Influence of vacuum atmosphere by chamber baking, moisture content in process gas lines, outgasing of co-sputtering cathode equipped with magnetic fluid, and particle sources in fore-pump. are re-checked again in research process for perpendicular magnetic recording media.
AB - Concept of ultra clean (UC) dry-process proposed by present authors in 1990s has been widely used in various thin film fabrication fields from the view point of research as well as volume production stages of electronic devices. Original basic concept for UC-process sometimes are lead to another wrong concept direction, usually caused by a compromise for temporal trial, space limitation, facility, and so on. In this paper, UC technological items originally proposed is briefly reviewed. Influence of vacuum atmosphere by chamber baking, moisture content in process gas lines, outgasing of co-sputtering cathode equipped with magnetic fluid, and particle sources in fore-pump. are re-checked again in research process for perpendicular magnetic recording media.
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U2 - 10.3131/jvsj2.53.521
DO - 10.3131/jvsj2.53.521
M3 - Review article
AN - SCOPUS:78649842182
SN - 1882-2398
VL - 53
SP - 521
EP - 526
JO - Journal of the Vacuum Society of Japan
JF - Journal of the Vacuum Society of Japan
IS - 9
ER -