Resistance of LiCaAlF6 Single Crystals against F2 Laser Irradiation

Yoshizo Kawaguchi; Aiko Narazaki; Hiroyuki Niino; Hiroki Sato; Tsuguo Fukuda; Kiyoshi Shimamura

doi:10.1143/jjap.42.l1015

Resistance of LiCaAlF₆ Single Crystals against F₂ Laser Irradiation

Yoshizo Kawaguchi, Aiko Narazaki, Hiroyuki Niino, Hiroki Sato, Tsuguo Fukuda, Kiyoshi Shimamura

New Industry Creation Hatchery Center (NICHe)

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

The resistance of LiCaAlF₆ single crystals against F ₂ laser irradiation was studied to examine the possible use of LiCaAlF₆ as optical components for F₂ laser lithography. After the initial increase by F₂ laser cleaning, transmittance of LiCaAlF₆ at 157 nm remains relatively unchanged even after irradiation with an F₂ laser beam up to 10₅ pulses at a fluence of approximately 160 mJ·cm^-2·pulse ^-1, indicating good tolerance against the cumulative irradiation. We also discuss the mechanism of the initial increase in transmittance with the results of X-ray photoelectron spectroscopy (XPS). The threshold fluence for the onset of optical damage of LiCaAlF₆ is approximately 2 J·cm^-2·pulse^-1, similar to that of vacuum ultraviolet (VUV) grade CaF₂.

Original language	English
Pages (from-to)	L1015-L1017
Journal	Japanese Journal of Applied Physics
Volume	42
Issue number	8 B
DOIs	https://doi.org/10.1143/jjap.42.l1015
Publication status	Published - 2003 Aug 15

Keywords

F laser
LiCaAlF
Optical damage
Optical endurance
Threshold fluence
Transmittance
Vacuum ultraviolet light
XPS

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10.1143/jjap.42.l1015

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@article{7ebfffec49c449afa392e950478cdd78,

title = "Resistance of LiCaAlF6 Single Crystals against F2 Laser Irradiation",

abstract = "The resistance of LiCaAlF6 single crystals against F 2 laser irradiation was studied to examine the possible use of LiCaAlF6 as optical components for F2 laser lithography. After the initial increase by F2 laser cleaning, transmittance of LiCaAlF6 at 157 nm remains relatively unchanged even after irradiation with an F2 laser beam up to 105 pulses at a fluence of approximately 160 mJ·cm-2·pulse -1, indicating good tolerance against the cumulative irradiation. We also discuss the mechanism of the initial increase in transmittance with the results of X-ray photoelectron spectroscopy (XPS). The threshold fluence for the onset of optical damage of LiCaAlF6 is approximately 2 J·cm-2·pulse-1, similar to that of vacuum ultraviolet (VUV) grade CaF2.",

keywords = "F laser, LiCaAlF, Optical damage, Optical endurance, Threshold fluence, Transmittance, Vacuum ultraviolet light, XPS",

author = "Yoshizo Kawaguchi and Aiko Narazaki and Hiroyuki Niino and Hiroki Sato and Tsuguo Fukuda and Kiyoshi Shimamura",

year = "2003",

month = aug,

day = "15",

doi = "10.1143/jjap.42.l1015",

language = "English",

volume = "42",

pages = "L1015--L1017",

journal = "Japanese Journal of Applied Physics",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "8 B",

}

TY - JOUR

T1 - Resistance of LiCaAlF6 Single Crystals against F2 Laser Irradiation

AU - Kawaguchi, Yoshizo

AU - Narazaki, Aiko

AU - Niino, Hiroyuki

AU - Sato, Hiroki

AU - Fukuda, Tsuguo

AU - Shimamura, Kiyoshi

PY - 2003/8/15

Y1 - 2003/8/15

N2 - The resistance of LiCaAlF6 single crystals against F 2 laser irradiation was studied to examine the possible use of LiCaAlF6 as optical components for F2 laser lithography. After the initial increase by F2 laser cleaning, transmittance of LiCaAlF6 at 157 nm remains relatively unchanged even after irradiation with an F2 laser beam up to 105 pulses at a fluence of approximately 160 mJ·cm-2·pulse -1, indicating good tolerance against the cumulative irradiation. We also discuss the mechanism of the initial increase in transmittance with the results of X-ray photoelectron spectroscopy (XPS). The threshold fluence for the onset of optical damage of LiCaAlF6 is approximately 2 J·cm-2·pulse-1, similar to that of vacuum ultraviolet (VUV) grade CaF2.

AB - The resistance of LiCaAlF6 single crystals against F 2 laser irradiation was studied to examine the possible use of LiCaAlF6 as optical components for F2 laser lithography. After the initial increase by F2 laser cleaning, transmittance of LiCaAlF6 at 157 nm remains relatively unchanged even after irradiation with an F2 laser beam up to 105 pulses at a fluence of approximately 160 mJ·cm-2·pulse -1, indicating good tolerance against the cumulative irradiation. We also discuss the mechanism of the initial increase in transmittance with the results of X-ray photoelectron spectroscopy (XPS). The threshold fluence for the onset of optical damage of LiCaAlF6 is approximately 2 J·cm-2·pulse-1, similar to that of vacuum ultraviolet (VUV) grade CaF2.

KW - F laser

KW - LiCaAlF

KW - Optical damage

KW - Optical endurance

KW - Threshold fluence

KW - Transmittance

KW - Vacuum ultraviolet light

KW - XPS

UR - http://www.scopus.com/inward/record.url?scp=0142126800&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0142126800&partnerID=8YFLogxK

U2 - 10.1143/jjap.42.l1015

DO - 10.1143/jjap.42.l1015

M3 - Article

AN - SCOPUS:0142126800

SN - 0021-4922

VL - 42

SP - L1015-L1017

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 8 B

ER -

Resistance of LiCaAlF₆ Single Crystals against F₂ Laser Irradiation

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Keywords

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