Abstract
We report the fabrication of a solenoidal microcoil mould structure based on reactive ion etching (RIE) of 100 μm thick borosilicate glass wafers. For magnetic resonance imaging (MRI), glass has superior properties compared to silicon, e.g. the lower dielectric constant and transparency. Double-side polished substrates are pre-etched in a two step process, and then anodically bonded together to achieve a hollow structure inside the coil to serve as a sample container. Two additional etch steps that are each performed on the top and bottom surfaces of the bonded wafers complete the solenoidal coil mould structure.
Original language | English |
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Title of host publication | Proceedings - CIS Workshops 2007, 2007 International Conference on Computational Intelligence and Security Workshops, CISW 2007 |
Pages | 345-348 |
Number of pages | 4 |
Publication status | Published - 2007 Dec 1 |
Event | 20th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2007 - Kobe, Japan Duration: 2007 Jan 21 → 2007 Jan 25 |
Other
Other | 20th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2007 |
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Country/Territory | Japan |
City | Kobe |
Period | 07/1/21 → 07/1/25 |
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Mechanical Engineering
- Condensed Matter Physics
- Electronic, Optical and Magnetic Materials