We investigated the saturation magnetostriction (λs) of an ultrathin CoFe free-layer on double-layered underlayers of Ru/Cu. By increasing the Ru underlayer thickness, λs becomes positively large; on the other hand, λs becomes negatively large by increasing the Cu underlayer thickness. This tendency can be explained by the model where λs is changed by the film strain. The λs sensitivity on the Cu underlayer thickness becomes large with increasing the Co concentration of the CoFe free-layer. This indicates that CoFe λs becomes sensitive to strain with increasing Co concentration. In order to realize small magnetostriction spin-valve films with an ultrathin CoFe free-layer, we have to take care of the lattice strain of the film.
|Number of pages||5|
|Journal||Journal of Applied Physics|
|Publication status||Published - 2002 Feb 15|
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)
- Physics and Astronomy(all)