Scanning tunneling microscopy observation of the initial state of oxidation in ferromagnetic tunnel junctions

Masamitsu Hayashi, Yasuo Ando, Terunobu Miyazaki

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Abstract

The initial oxidation process of thin aluminum films used in ferromagnetic tunnel junctions was investigated by scanning tunneling microscopy (STM). The STM images reveal the progression of oxygen penetration into an aluminum film composed of small grains. The oxygen first covers the aluminum grain surface homogeneously. At the same time, the oxygen is inserted into the aluminum grain boundaries. As the oxidation proceeds, the oxygen penetrates inside the grain.

Original languageEnglish
Pages (from-to)L1317-L1319
JournalJapanese Journal of Applied Physics
Volume40
Issue number12 A
DOIs
Publication statusPublished - 2001 Dec 1

Keywords

  • AFM
  • Ferromagnetic tunnel junction
  • Local transport
  • Radical oxidation
  • STM
  • TMR

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