The initial stage of the reaction of dichlorosilane (SiH 2 Cl 2 ) with the Si(111)-(7 × 7) surface under exposure below 1 L is investigated using a scanning tunneling microscope (STM). We found that corner adatoms are preferentially reacted over the center adatoms at the very beginning of exposure. The initial reaction process of SiH 2 Cl 2 with Si(111)-(7 × 7) surface is discussed. It is suggested that the preferential reactivity of a corner-hole atom is reduced as the exposure increases, which may give rise to reacted rest atoms.
- Dissociative adsorption
- Initial reaction
- Preferential adsorption site
- Scanning tunneling microscopy