Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition

Engineering

• Ion Implantation 100%
• Atomic Layer Deposition 50%
• Selective Etching 16%
• Interlayer 16%
• Si Surface 16%
• Properties 16%
• Surfaces 16%
• Energy Engineering 16%

Material Science

• Liquid Films 100%
• Al2O3 50%
• Single Crystal 16%
• Surface 16%
• Material 16%
• Amorphous Material 16%

Physics

• Atomic Layer Epitaxy 50%
• Deposition 33%
• Mixing 33%
• Single Crystals 16%
• Area 16%
• Revisions 16%