TY - JOUR
T1 - Semiconductor property imaging on as-grown wafer with monochromatic tunable THz-wave source
AU - Hamano, Akihide
AU - Ohno, Seigo
AU - Minamide, Hiroaki
AU - Ito, Hiromasa
N1 - Publisher Copyright:
© 2018 Author(s).
PY - 2018/7/1
Y1 - 2018/7/1
N2 - In this paper, we propose the use of a tunable monochromatic terahertz (THz) wave source to measure the carrier properties of semiconductors. We also report on the recent improvement of our measurement system and demonstrate its ability to measure an as-grown sample; our system involves reference mirror-free reflective measurement. In our method, carrier properties, such as resistivity and mobility in semiconductors relating to the carrier density, can be determined by reflective measurement. This method was applied to composite semiconductors - GaN, GaAs, and SiC. In the measurement system, we improved the filter to block the infrared beam co-linearly propagating with the desired THz-wave. Consequently, the signal intensity was 13 times higher than that achieved in our previous work. We demonstrated the measured carrier properties in an as-grown n-type GaN wafer. We observed flat features via our THz-reflective measurement, whereas the sample showed prominent surface roughness in a picture taken with visible light.
AB - In this paper, we propose the use of a tunable monochromatic terahertz (THz) wave source to measure the carrier properties of semiconductors. We also report on the recent improvement of our measurement system and demonstrate its ability to measure an as-grown sample; our system involves reference mirror-free reflective measurement. In our method, carrier properties, such as resistivity and mobility in semiconductors relating to the carrier density, can be determined by reflective measurement. This method was applied to composite semiconductors - GaN, GaAs, and SiC. In the measurement system, we improved the filter to block the infrared beam co-linearly propagating with the desired THz-wave. Consequently, the signal intensity was 13 times higher than that achieved in our previous work. We demonstrated the measured carrier properties in an as-grown n-type GaN wafer. We observed flat features via our THz-reflective measurement, whereas the sample showed prominent surface roughness in a picture taken with visible light.
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U2 - 10.1063/1.5025228
DO - 10.1063/1.5025228
M3 - Article
C2 - 30068150
AN - SCOPUS:85049633444
SN - 0034-6748
VL - 89
JO - Review of Scientific Instruments
JF - Review of Scientific Instruments
IS - 7
M1 - 073701
ER -