TY - JOUR
T1 - Shape Transformation Photolithography
T2 - Self-Assembled Arrays of Suspended MEMS Structures from Patterned Polymer Membranes
AU - Sherehiy, Andriy
AU - Rathfon, Jeremy M.
AU - Abe, Hiroya
AU - Chowdhury, Sri Sukanta
AU - Cohn, Robert W.
N1 - Funding Information:
This study was partially supported with funds from National Science Foundation (ECCS 0506941) and the Kentucky Science and Technology Corporation (KSEF-1947-RDE-012).
Publisher Copyright:
© 2018 American Chemical Society.
PY - 2018/12/27
Y1 - 2018/12/27
N2 - Suspended micromechanical structures are typically formed by dissolving underlying spacer material. However, capillary force-induced collapse during solvent removal can damage soft structures. If instead capillary forces are directed in the plane, they can drive liquid polymeric bridges to directly transform into suspended fibers. The various capillary force-directed methods for fabricating arrays of suspended fibers have suffered from either low manufacturing rates or an inability to produce arbitrary patterns. Shape transformation photolithography (STP) demonstrated herein is a method of producing arbitrarily patterned arrays of suspended fibers that are potentially capable of high fabrication rates. In STP, holes are prepatterned in a polymer nanofilm supported on a micropillar array, and then the film is heated above its glass transition temperature. First, the holes expand by dewetting and then capillary forces drive thinning of the polymer channels defined by the holes. Prepatterning overcomes the energy barrier for hole nucleation and ensures that all fibers form at the same time and with similar diameters. Arrays of fibers and fiber lattice networks are formed from dyed polystyrene films that are patterned with nanosecond laser pulses at 532 nm. The exposure threshold for forming holes is 10.5 mJ/cm2 for single pulses and 3.3 mJ/cm2 per pulse for repetitive pulsing, which is only about 3× larger than the dose available from current 193 nm wafer-stepping projection printers that are used in device manufacture. With the increased absorption of polystyrene at 193 nm and with additional proposed material modifications to the thin film, it may even be possible to employ STP in production wafer steppers at economically feasible manufacturing rates of over 50 wafers/h.
AB - Suspended micromechanical structures are typically formed by dissolving underlying spacer material. However, capillary force-induced collapse during solvent removal can damage soft structures. If instead capillary forces are directed in the plane, they can drive liquid polymeric bridges to directly transform into suspended fibers. The various capillary force-directed methods for fabricating arrays of suspended fibers have suffered from either low manufacturing rates or an inability to produce arbitrary patterns. Shape transformation photolithography (STP) demonstrated herein is a method of producing arbitrarily patterned arrays of suspended fibers that are potentially capable of high fabrication rates. In STP, holes are prepatterned in a polymer nanofilm supported on a micropillar array, and then the film is heated above its glass transition temperature. First, the holes expand by dewetting and then capillary forces drive thinning of the polymer channels defined by the holes. Prepatterning overcomes the energy barrier for hole nucleation and ensures that all fibers form at the same time and with similar diameters. Arrays of fibers and fiber lattice networks are formed from dyed polystyrene films that are patterned with nanosecond laser pulses at 532 nm. The exposure threshold for forming holes is 10.5 mJ/cm2 for single pulses and 3.3 mJ/cm2 per pulse for repetitive pulsing, which is only about 3× larger than the dose available from current 193 nm wafer-stepping projection printers that are used in device manufacture. With the increased absorption of polystyrene at 193 nm and with additional proposed material modifications to the thin film, it may even be possible to employ STP in production wafer steppers at economically feasible manufacturing rates of over 50 wafers/h.
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U2 - 10.1021/acsomega.8b02763
DO - 10.1021/acsomega.8b02763
M3 - Article
AN - SCOPUS:85059505720
SN - 2470-1343
VL - 3
SP - 18489
EP - 18498
JO - ACS Omega
JF - ACS Omega
IS - 12
ER -