Silicate reaction control at lanthanum oxide and silicon interface for equivalent oxide thickness of 0.5 nm: Adjustment of amount of residual oxygen atoms in metal layer

Daisuke Kitayama, Toru Kubota, Tomotsune Koyanagi, Kuniyuki Kakushima, Parhat Ahmet, Kazuo Tsutsui, Akira Nishiyama, Nobuyuki Sugii, Kenji Natori, Takeo Hattori, Hiroshi Iwai

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